(3) Radio Frequency Plasma CVD (RFCVD)RF inogona kushandiswa kugadzira plasma nenzira mbiri dzakasiyana, capacitive coupling method uye inductive coupling method.RF plasma CVD inoshandisa frequency 13.56 MHz.Chakanakira RF plasma ndechekuti inopararira pane imwe nzvimbo yakakura kwazvo yekuganhurira. plasma ndeyokuti kuwanda kwe plasma hakuna kunaka kwekupfira, kunyanya kana plasma iine argon.Capacitively coupled plasma haikodzeri kukura mafirimu edhaimondi emhando yepamusoro sezvo ion bombardment kubva muplasma inogona kutungamirira kukukuvadza kwakanyanya kwedhaimondi. Polycrystalline diamond mafirimu akakura achishandisa RF induced plasma under deposition conditions akafanana nemicrowave plasma CVD.Homogeneous epitaxial diamond films akawanikwawo achishandisa RF-induced plasma-enhanced CVD.
(4) DC Plasma CVD
DC plasma ndiyo imwe nzira yekumisikidza gasi sosi (kazhinji musanganiswa weH2, uye hydrocarbon gasi) yedhaimani firimu kukura.DC plasma-inobatsirwa CVD inokwanisa kukura nzvimbo dzakakura dzemafirimu edhaimondi, uye saizi yenzvimbo yekukura inogumira chete nehukuru hwemagetsi uye DC magetsi. dzinoiswa pamwero we80 mm/h. Pamusoro pezvo, sezvo nzira dzakasiyana siyana dzeDC arc dzichigona kuisa emhando yepamusoro mabhaisikopo edhaimani pane asiri-dhaimani substrates pamitengo yakakwira deposition, vanopa nzira inotengeswa yekuisa mafirimu edhaimani.
(5) Electron cyclotron resonance microwave plasma yakawedzera kemikari vapor deposition (ECR-MPECVD)Iyo DC plasma, RF plasma, uye microwave plasma yakatsanangurwa kare zvese zvinoparadzanisa nekuora H2, kana mahydrocarbons, kuita atomic hydrogen uye kabhoni-hydrogen atomu mapoka, nekudaro zvichibatsira mukuumbwa kwedhaimondi matete firimu. Sezvo electron cyclotron resonance plasma inogona kubudisa high density plasma (> 1x1011cm-3), ECR-MPECVD inonyanya kukodzera kukura uye kuiswa kwemadhaimondi mafirimu. rabhoritari.
-Chinyorwa ichi chakaburitswa nemugadziri wevacuum coating muchina Guangdong Zhenhua
Nguva yekutumira: Jun-19-2024