Fa'alava fa'alava iona ma togitogi fa'alava

1. Ion beam sputtering coating

O le pito i luga o le mea o loʻo osofaʻia i se laʻau eletise eletise, ma o le malosi o ion e le ulu atu i le lattice tioata o le meafaitino, ae faʻafeiloaʻi le malosi i atoms taulaʻi, ma mafua ai ona latou oso ese mai luga o le mea, ona fausia ai lea o se ata manifinifi e ala i le tuʻuina i luga o le mea faigaluega. Ona o le sputtering na gaosia e le ion beam, o le malosi o le sputtered film layer atoms e maualuga tele, ma o le mea autu o loʻo osofaʻia i le ion beam i se vacuum maualuga, o le mama o le ata tifaga e maualuga, ma e mafai ona teuina ata tifaga maualuga, aʻo faʻaleleia le mautu o le ion beam layer film, lea e mafai ona ausia le faʻamoemoega o le faʻaleleia o le masini. O le fa'amoemoega o le fa'ama'i o le ion beam sputtering o le fausia lea o mea fou ata tifaga manifinifi.

2. togitogiga o le ion beam

Ion beam etching o se ala-malosi ion beam bombardment o luga o le mea e maua ai sputtering, etching aafiaga i luga o le substrate, o se masini semiconductor, masini optoelectronic ma isi vaega o le gaosiga o tekinolosi autu ata. O le tekinolosi sauniuni mo tupe meataalo i totonu o le semiconductor integrated circuits e aofia ai le saunia o le faitau miliona o transistors i luga o se faʻamaʻi silikoni maʻa e tasi ma le lautele o le Φ12in (Φ304.8mm). O transistor taʻitasi e fausia mai le tele o faʻasologa o ata manifinifi ma galuega eseese, e aofia ai se vaega galue, se faʻamaufaʻailoga, se faʻaesea, ma se faʻatonuga. O vaega ta'itasi ta'itasi e iai lona lava mamanu, o lea pe a uma ona fa'apipi'i vaega ta'itasi o ata fa'atino, e mana'omia ona toe togitogia vaega lē aoga ma se fa'alava o le ion, ma tu'u ai le fa'aogaina lelei o vaega ata tifaga. I aso nei, o le lautele o le uaea o le pu ua oʻo i le 7mm, ma e manaʻomia le etching beam e saunia ai se mamanu lelei. Ion beam etching o se auala etching mago ma maualuga etching saʻo faʻatusatusa i le susū etching metotia na faʻaaogaina i le amataga.

Ion beam etching technology with inactive beam beam etching and active beam beam etching with two kinds. O le mea muamua ma argon ion beam etching, e patino i le gaioiga faaletino; o le mea mulimuli ma fluorine ion beam sputtering, fluorine ion beam i le faaopoopo atu i le malosi maualuga e maua ai le matafaioi o le tramp, fluorine ion beam e mafai foi ona togitogi ma SiO₂、Si₃N4, GaAs, W ma isi ata manifinifi o loʻo i ai se gaioiga faʻamaʻi, o le gaioiga faʻaletino uma, ae faʻapea foʻi ma le gaioiga faʻainisinia o le tekinolosi etching beam, o le fua o le etching e vave. O kasa fa'a'ala'au e fa'aoso o le CF₄、C₂F₆、CCl4, BCl₃, ma isi, mea fa'atupu fa'atupu mo SiF₄、SiCl₄、GCl₃;, ma WF₆ o kasa pala e maua mai. Ion beam etching technology o le tekonolosi autu lea e gaosia ai oloa maualuga-tech.

–O lenei tusiga ua tatalaina emasini fa'apipi'i gaogao gaosimeaGuangdong Zhenhua