Ion beam sputtering coating hamwe na ion beam etching

1. Ion beam sputtering coating

Ubuso bwibikoresho byatewe hejuru yingufu ziciriritse ion, kandi ingufu za ion ntizinjira mumatara ya kirisiti yibikoresho, ahubwo zohereza ingufu kuri atome yagenewe, bigatuma zisohoka kure yubuso bwibikoresho, hanyuma zigakora firime yoroheje mugushira kumurimo. Bitewe no gusohora kwakozwe na ion beam, ingufu za atome ya firime ya firime isukuye ni ndende cyane, kandi ibikoresho bigenewe guterwa ibisasu hamwe na ion beam mu cyuho kinini, ubuziranenge bwurwego rwa firime ni bwinshi, kandi ama firime yo mu rwego rwo hejuru arashobora kubikwa, mugihe ituze ryama firime ya ion beam ryatezimbere, bikaba bishobora kugera ku ntego yo kuzamura imiterere ya optique na mashini ya firime. Intego ya ion beam sputtering nugukora ibikoresho bishya bya firime.

2. Ion beam etching

Ion beam etching nayo ningufu ziciriritse ion beam bombardment hejuru yibikoresho kugirango itange sputtering, etching ingaruka kuri substrate, nigikoresho cya semiconductor, ibikoresho bya optoelectronic nibindi bice byo gukora tekinoroji yibanze. Tekinoroji yo gutegura chip muri semiconductor ihuriweho na sisitemu ikubiyemo gutegura amamiriyoni ya tristoriste kuri wafer imwe ya kirisiti ya silicon hamwe na diameter ya Φ12in (Φ304.8mm). Buri tristoriste yubatswe kuva mubice byinshi bya firime yoroheje ifite imirimo itandukanye, igizwe nigikorwa gikora, urwego rukingira, urwego rwo kwigunga, hamwe nuyobora. Buri cyiciro gikora gifite uburyo bwacyo, kuburyo nyuma ya buri cyiciro cya firime ikora isizwe, ibice bidafite akamaro bigomba guhuzwa hamwe na ion beam, bigasigara ibice byingirakamaro bya firime. Muri iki gihe, ubugari bw'insinga za chip bugeze kuri 7mm, kandi ion beam irakenewe kugirango utegure urugero rwiza. Ion beam etching nuburyo bwumye bwumye hamwe nukuri neza ugereranije nuburyo bwo gutose butose bwakoreshejwe mugitangira.

Ion beam yogukoresha tekinoroji hamwe na ion beam idakora hamwe na ion beam ikora hamwe nubwoko bubiri. Iyambere hamwe na argon ion beam etching, ni iyimyitwarire yumubiri; icya nyuma hamwe na fluor ion beam sputtering, fluor ion beam hiyongereyeho ingufu nyinshi zo gutanga uruhare rwa tramp, urumuri rwa fluor ion na rwo rushobora gushirwa hamwe na SiO₂、 Si₃N4 、 GaAs 、 W hamwe nizindi firime zinanutse zifite imiti, ni inzira yumubiri, ariko kandi nuburyo bwo kuvura imiti ya tekinoroji ya ion beam, igipimo cyihuta. Imyitwarire ya gaze yangiza ni CF₄、 C.₂F₆CCl4 、 BCl₃, nibindi, ibyakozwe byakozwe kuri SiF₄、 SiCl₄、 GCl₃; 、 Na WF₆ ni imyuka yangiza. Ion beam etching tekinoroji ni tekinoroji yingenzi yo gukora ibicuruzwa byikoranabuhanga.

–Iyi ngingo yasohowe naimashini ikora imashiniGuangdong Zhenhua