Kuyika kwa ion mtengo wa ion sputtering ndi ion mtengo wa ion

1. Kupaka kwa ion mtengo wa sputtering

Pamwamba pa zinthuzo amawombedwa ndi mtengo wa ion-energy, ndipo mphamvu ya ayoni sichilowa mumtambo wa kristalo wa zinthuzo, koma kusamutsa mphamvu ku maatomu omwe akukhudzidwa, kuwapangitsa kuti atuluke kutali ndi zinthuzo, kenako amapanga filimu yopyapyala poyika pa workpiece. Chifukwa cha sputtering opangidwa ndi mtengo ion, mphamvu ya sputtered filimu wosanjikiza maatomu ndi okwera kwambiri, ndi chandamale chandamale ndi bomba ion mtengo mu vacuum mkulu, chiyero cha filimu wosanjikiza ndi mkulu, ndi apamwamba mafilimu akhoza waikamo, pamene bata la ion mtengo wosanjikiza filimu wosanjikiza bwino, amene angathe kukwaniritsa cholinga cha filimu wosanjikiza ndi kukonza filimu wosanjikiza. Cholinga cha ion mtengo sputtering ndi kupanga zatsopano woonda filimu zipangizo.

2. Kuyika mtengo wa ion

Ion mtengo etching ndi sing'anga-mphamvu ion mtengo bombardment pamwamba pa zinthu kuti sputtering, etching zotsatira pa gawo lapansi, ndi semiconductor chipangizo, zipangizo optoelectronic ndi madera ena a kupanga zithunzi pachimake luso. Ukadaulo wokonzekera tchipisi mumayendedwe ophatikizika a semiconductor umaphatikizapo kukonzekera mamiliyoni a ma transistors pa crystal wafer ya silicon yokhala ndi mainchesi a Φ12in (Φ304.8mm). Transistor iliyonse imapangidwa kuchokera kumagulu angapo amafilimu opyapyala okhala ndi ntchito zosiyanasiyana, okhala ndi gawo logwira ntchito, chosanjikiza chotchinga, chosanjikiza chodzipatula, ndi chowongolera. Chigawo chilichonse chogwira ntchito chimakhala ndi kachitidwe kake, kotero kuti filimu iliyonse yogwira ntchito ikaphwanyidwa, zigawo zopanda pake ziyenera kuchotsedwa ndi mtengo wa ion, kusiya zigawo zothandiza za filimuyo. Masiku ano, m'lifupi waya wa chip wafika 7mm, ndi ion mtengo etching ndi zofunika kukonzekera chitsanzo chabwino chotero. Ion beam etching ndi njira yowuma yokhotakhota yomwe imakhala yolondola kwambiri poyerekeza ndi njira yonyowa yomwe idagwiritsidwa ntchito poyambirira.

Ukadaulo wa ion beam etching wokhala ndi chitsulo chosagwira ntchito cha ion mtengo komanso etching yogwira yamitundu iwiri. Yoyamba yokhala ndi argon ion mtengo etching, ndi ya momwe thupi limachitira; yotsirizira yokhala ndi fluorine ion beam sputtering, fluorine ion mtengo kuphatikiza ndi mphamvu yayikulu kuti ipange gawo la tramp, fluorine ion mtengo imathanso kukhazikika ndi SiO₂, Si₃N4, GaAs, W ndi mafilimu ena woonda ndi anachita mankhwala, ndi zonse thupi anachita ndondomeko, komanso mankhwala anachita ndondomeko ion mtengo etching luso, mlingo etching ndi kudya. Rection etching gasi zikuwononga ndi CF₄, C₂F₆Chithunzi cha CCl4BCl₃, etc., zopangira zopangira za SiF₄, SiCl₄, GCl₃; ndi wf₆ ndi mpweya wowononga amachotsedwa. Ukadaulo wa ion beam etching ndiye ukadaulo wofunikira kwambiri wopanga zinthu zapamwamba kwambiri.

-Nkhaniyi yatulutsidwa ndiwopanga makina opangira vacuumGuangdong Zhenhua