Ndoputa nke uzuoku kemịkalụ nke na-akpali okpomọkụ

N'ozuzu, mmeghachi omume CVD na-adabere na okpomọkụ dị elu, nke a na-akpọ ya thermally excited chemical vapor deposition (TCVD). Ọ na-ejikarị ihe ndị na-eme ka ihe ghara ịdị ndụ ma a na-arụ ya na reactors ọkụ-mgbidi na oyi-mgbidi. Usoro ndị a na-eme ka ihe dị ọkụ gụnyere kpo oku redio ugboro ugboro (RF), kpo oku radieshon infrared, kpo oku iguzogide, wdg.

Ntinye anwụrụ ọkụ kemịkalụ mgbidi na-ekpo ọkụ
N'ezie, ihe nrụpụta ihe nrụpụta ihe nrụpụta ihe ọkụkụ na-ekpo ọkụ bụ ọkụ thermostatic, nke a na-ejikarị ihe ndị na-eguzogide ọgwụ eme ihe, maka mmepụta oge ụfọdụ. E gosiri eserese nke ebe mmepụta ihe nrụpụta ihe nrụpụta ihe ọkụkụ na-ekpo ọkụ maka mkpuchi ngwaọrụ chip dị ka ndị a. Ihe nrụpụta ihe nrụpụta ihe ọkụkụ a na-ekpo ọkụ nwere ike ikpuchi TiN, TiC, TiCN na ihe nkiri ndị ọzọ dị gịrịgịrị. Enwere ike ịhazi ihe nrụpụta ahụ ka ọ buru ibu nke ọma wee jide ọtụtụ ihe mejupụtara ya, enwere ike ijikwa ọnọdụ ndị ahụ kpọmkwem maka itinye ya. Foto 1 na-egosi ngwaọrụ oyi akwa epitaxial maka doping silicon nke mmepụta ngwaọrụ semiconductor. A na-etinye ihe dị n'ime ọkụ ahụ n'akụkụ kwụ ọtọ iji belata mmetọ nke elu ihe nrụpụta site na obere ihe, ma mee ka ibu mmepụta dịkwuo elu. A na-ejikarị ihe nrụpụta ihe ọkụkụ na-ekpo ọkụ maka mmepụta semiconductor na-arụ ọrụ na obere nrụgide.