Ka waiho ʻana o ka mahu kemika i hoʻonāukiuki ʻia e ka wela

Ma keʻano laulā, hilinaʻi nā hopena CVD i nā mahana kiʻekiʻe, no laila ua kapa ʻia ʻo thermally excited chemical vapor deposition (TCVD). Hoʻohana pinepine ia i nā precursors inorganic a hana ʻia i loko o nā reactors paia wela a me nā reactors paia anuanu. ʻO kāna mau ʻano hoʻomehana e pili ana i ka hoʻomehana alapine radio (RF), ka hoʻomehana radiation infrared, ka hoʻomehana kū'ē, a me nā mea ʻē aʻe.

Ka waiho ʻana o ka mahu kemika pā wela
ʻO ka mea maoli, ʻo ka mea hana hoʻokaʻawale mahu kemika paia wela he umu thermostatic, i hoʻomehana pinepine ʻia me nā mea resistive, no ka hana intermittent. Hōʻike ʻia ke kiʻi o kahi hale hana hana hoʻokaʻawale mahu kemika paia wela no ka uhi ʻana i nā mea hana chip e like me kēia. Hiki i kēia hoʻokaʻawale mahu kemika paia wela ke uhi iā TiN, TiC, TiCN a me nā kiʻiʻoniʻoni lahilahi ʻē aʻe. Hiki ke hoʻolālā ʻia ka mea hana i ka nui a laila e paʻa i kahi nui o nā ʻāpana, a hiki ke hoʻomalu pono ʻia nā kūlana no ka hoʻokaʻawale ʻana. Hōʻike ʻo Pic 1 i kahi mea hana papa epitaxial no ka doping silicon o ka hana ʻana o nā mea semiconductor. Hoʻonoho ʻia ka substrate i loko o ka umu i kahi kuhikuhi kū pololei e hōʻemi i ka haumia o ka ʻili o ka hoʻokaʻawale ʻana e nā ʻāpana, a hoʻonui nui i ka ukana hana. Hoʻohana pinepine ʻia nā mea hana paia wela no ka hana semiconductor ma nā kaomi haʻahaʻa.