(3) Redio Frequency Plasma CVD (RFCVD) RF nwere ike iji mepụta plasma site na ụzọ abụọ dị iche iche, usoro njikọ capacitive na usoro njikọ inductive. sputtering, karịsịa ma ọ bụrụ na plasma nwere argon. Capacitively jikọtara plasma adịghị adabara na-eto eto elu àgwà fim diamond ebe ọ bụ na ion bombardment si plasma nwere ike ime ka oké mmebi nke diamond. A na-emepụta ihe nkiri diamond polycrystalline site na iji plasma na-ebute RF n'okpuru ọnọdụ nkwụnye ego yiri plasma CVD.
(4) DC Plasma CVD
DC plasma bụ ụzọ ọzọ nke ịgbalite isi iyi gas (n'ozuzu ngwakọta nke H2, na hydrocarbon gas) maka diamond film growth.DC plasma-enyere CVD nwere ike na-eto eto buru ibu ebe nke diamond film, na size nke uto ebe bụ nanị site size nke electrodes na DC ike ọkọnọ. Ọzọ uru nke DC plasma-enyere CVD aka bụ guzobe nke a na-ahụkarị usoro nke ihe nkiri diamond 8 a na-enweta site na ntinye ihe nkiri nke DC8 nke a na-enweta site na ntinye ihe nkiri nke DC8. mm/h. Tụkwasị na nke ahụ, ebe ọ bụ na ụzọ DC arc dị iche iche nwere ike itinye ihe nkiri diamond dị elu na ihe ndị na-abụghị diamond na ọnụ ọgụgụ dị elu, ha na-enye usoro ahịa maka ntinye ihe nkiri diamond.
(5) Electron cyclotron resonance microwave plasma enhanced chemical vapor deposition (ECR-MPECVD)The DC plasma, RF plasma, na microwave plasma kọwara na mbụ niile dissociate na decompose H2, ma ọ bụ hydrocarbons, n'ime atomiki hydrogen na carbon-hydrogen atom otu, si otú na-enye aka na guzobe diamond mkpa film. Ebe ọ bụ na plasma resonance nke electron cyclotron nwere ike ịmepụta plasma njupụta dị elu (> 1x1011cm-3), ECR-MPECVD dị mma maka uto na ntinye nke ihe nkiri diamond. Otú ọ dị, n'ihi nrụgide gas dị ala (10-4- ruo 10-2 Torr) nke a na-eji na usoro ECR, nke na-eme ka ọnụ ọgụgụ dị ala na-arụ ọrụ nke ihe nkiri diamond dị ugbu a kwesịrị ekwesị, usoro ihe nkiri ahụ kwesịrị ekwesị ugbu a.
-Edepụtara akụkọ a site na onye nrụpụta igwe mkpuchi agụụ Guangdong Zhenhua
Oge nzipu: Jun-19-2024