Ion beam sputtering txheej thiab ion beam etching

1. Ion beam sputtering txheej

Qhov saum npoo ntawm cov khoom yog bombarded nrog ib tug nruab nrab-zog ion beam, thiab lub zog ntawm cov ions tsis nkag mus rau lub siv lead ua lattice ntawm cov khoom, tab sis hloov lub zog mus rau lub hom phiaj atoms, ua rau lawv sputter deb ntawm lub nto ntawm cov khoom, thiab ces tsim ib tug nyias zaj duab xis los ntawm deposition ntawm lub workpiece. Vim hais tias ntawm sputtering tsim los ntawm ion beam, lub zog ntawm sputtered zaj duab xis txheej atoms yog siab heev, thiab lub hom phiaj cov ntaub ntawv yog bombarded nrog lub ion beam nyob rau hauv ib tug siab nqus tsev vacuum, lub purity ntawm zaj duab xis txheej yog siab, thiab zoo films yuav muab tso, thaum lub stability ntawm lub ion beam zaj duab xis txheej yog zoo dua, uas muaj peev xwm ua tiav lub hom phiaj ntawm kev txhim kho zaj duab xis txheej. Lub hom phiaj ntawm ion beam sputtering yog tsim cov ntaub ntawv tshiab nyias nyias.

2. Ion beam etching

Ion beam etching kuj yog ib qho nruab nrab-zog ion beam bombardment ntawm qhov chaw ntawm cov khoom los tsim sputtering, etching nyhuv ntawm substrate, yog ib tug semiconductor ntaus ntawv, optoelectronic pab kiag li lawm thiab lwm qhov chaw ntawm zus tau tej cov graphics core technology. Kev npaj thev naus laus zis rau chips hauv semiconductor integrated circuits suav nrog kev npaj ntau lab ntawm cov transistors ntawm ib leeg-crystal silicon wafer nrog ib txoj kab uas hla ntawm Φ12in (Φ304.8mm). Txhua lub transistor yog tsim los ntawm ntau txheej txheej ntawm nyias zaj duab xis nrog cov haujlwm sib txawv, muaj cov txheej txheem nquag, txheej txheej insulating, txheej txheej cais, thiab txheej txheej txheej. Txhua txheej txheej txheem muaj nws tus qauv, yog li tom qab txhua txheej ntawm cov yeeb yaj kiab ua haujlwm tau plated, qhov tsis muaj txiaj ntsig yuav tsum tau muab tshem tawm nrog lub ion beam, tawm hauv cov yeeb yaj kiab uas muaj txiaj ntsig zoo. Niaj hnub no, cov hlau dav ntawm cov nti tau mus txog 7 hli, thiab ion beam etching yog tsim nyog los npaj cov qauv zoo li no. Ion beam etching yog ib txoj kev qhuav etching nrog siab etching raug piv rau cov txheej txheem ntub dej siv thaum pib.

Ion beam etching tshuab nrog inactive ion beam etching thiab nquag ion beam etching nrog ob yam. Lub qub nrog argon ion beam etching, belongs rau lub cev cov tshuaj tiv thaiv; tom kawg nrog fluorine ion beam sputtering, fluorine ion beam ntxiv rau lub zog siab los tsim lub luag haujlwm ntawm tramp, fluorine ion beam kuj tuaj yeem etched nrog SiO.₂, Si₃N4, GaAs, W thiab lwm cov yeeb yaj kiab nyias muaj cov tshuaj tiv thaiv, nws yog ob qho tib si cov txheej txheem tshuaj tiv thaiv lub cev, tab sis kuj yog cov txheej txheem tshuaj lom neeg ntawm ion beam etching technology, etching tus nqi yog ceev. Cov tshuaj tiv thaiv etching corrosive gases yog CF₄, C₂F₆, CCl4, BCl₃, thiab lwm yam, cov reactants generated rau SiF₄, SiCl₄, GCl₃;, thiab WF₆ yog corrosive gases muab rho tawm. Ion beam etching tshuab yog cov thev naus laus zis tseem ceeb los tsim cov khoom siv high-tech.

– Zaj lus no yog tso tawm los ntawmtshuab nqus tsev txheej tshuab manufacturersGuangdong Zhenhua