ʻO ka uhi ʻana o ka kukuna Ion a me ke kalai ʻana i ka kukuna ion

1. Ion beam sputtering uhi

Hoʻopili ʻia ka ʻili o ka mea me kahi kukui ion medium-energy, a ʻaʻole i komo ka ikehu o nā ion i ka lattice crystal o ka mea, akā e hoʻoneʻe i ka ikehu i nā ʻātoma i manaʻo ʻia, e hoʻokuʻu iā lākou mai ka ʻili o ka mea, a laila hana i kahi kiʻiʻoniʻoni ma ka waiho ʻana ma ka mea hana. Ma muli o ka sputtering i hana ʻia e ka ion beam, ʻoi aku ka kiʻekiʻe o ka ikehu o nā atoms layer film sputtered, a ua hoʻopaʻa ʻia ka mea i hoʻopaʻa ʻia me ka ion beam i loko o kahi mānoanoa kiʻekiʻe, kiʻekiʻe ka maʻemaʻe o ka papa kiʻiʻoniʻoni, a hiki ke waiho ʻia nā kiʻiʻoniʻoni kiʻekiʻe. ʻO ka manaʻo o ka ion beam sputtering ka hana ʻana i nā mea kiʻiʻoniʻoni lahilahi hou.

2. Kaʻili ʻana i ke kukui Ion

ʻO Ion beam etching kekahi mea hoʻoheheʻe i ka ion beam medium-energy o ka ʻili o ka mea e hana ai i ka sputtering, etching effect ma ka substrate, he mea semiconductor, nā mea optoelectronic a me nā wahi ʻē aʻe o ka hana ʻana i ka ʻenehana kumu kiʻi. ʻO ka ʻenehana hoʻomākaukau no nā kīʻaha i loko o nā kaapuni hoʻohui semiconductor e pili ana i ka hoʻomākaukau ʻana i nā miliona o nā transistors ma kahi wafer silicon hoʻokahi-crystal me ke anawaena o Φ12in (Φ304.8mm). Hoʻokumu ʻia kēlā me kēia transistor mai nā ʻāpana he nui o nā kiʻiʻoniʻoni lahilahi me nā hana like ʻole, i loko o kahi papa hana, kahi papa insulating, kahi ʻāpana kaʻawale, a me kahi papa conductive. Loaʻa i kēlā me kēia papa hana kona ʻano ponoʻī, no laila, ma hope o ka uhi ʻia ʻana o kēlā me kēia papa hana kiʻiʻoniʻoni, pono e kālai ʻia nā ʻāpana pono ʻole me kahi kukuna ion, e waiho mau ana i nā mea pono kiʻiʻoniʻoni. I kēia mau lā, ua hiki i ka 7mm ka laulā uea o ka chip, a pono ka etching ion beam e hoʻomākaukau ai i kahi ʻano maikaʻi. Ion beam etching mea he maloʻo etching kaʻina me ka kiʻekiʻe etching pono e hoohalikeia me ka pulu etching hana i hoʻohana 'ia i ka hoʻomaka.

Ion beam etching enehana me inactive ion beam etching and active ion beam etching with two kinds. ʻO ka mea mua me ka argon ion beam etching, no ka hopena kino; ʻO ka hope me ka fluorine ion beam sputtering, fluorine ion beam me ka ikehu kiʻekiʻe e hana i ka hana o ka tramp, hiki ke hoʻopaʻa ʻia ka fluorine ion beam me SiO₂、Si₃N4、GaAs、W a me nā kiʻi ʻoniʻoni lahilahi ʻē aʻe he hopena kemika, ʻo ia ke kaʻina hana kino, akā ʻo ke kaʻina hana kemika o ka ʻenehana etching beam, wikiwiki ka wikiwiki. ʻO nā kinoea corrosive ka hoʻololi ʻana he CF₄、C₂F₆、CCl4, BCl₃, a pela aku, na mea hoohuoi i hanaia no SiF₄、SiCl₄、GCl₃;、a me WF₆ he mau kinoea corrosive i unuhiia. ʻO Ion beam etching ʻenehana ka ʻenehana nui e hana i nā huahana kiʻekiʻe.

-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua