ʻenehana kiʻi ʻoniʻoni lahilahi daimana-mokuna2

(3) Hiki ke hoʻohana ʻia ka Radio Frequency Plasma CVD (RFCVD) RF e hana i ka plasma ma nā ʻano ʻano ʻelua, ke ʻano hoʻohui capacitive a me ke ʻano hoʻohui inductive. ka sputtering, ʻoi aku ka nui inā loaʻa i ka plasma argon. ʻAʻole kūpono ka plasma i hui pū ʻia no ka ulu ʻana i nā kiʻi daimana kiʻekiʻe no ka mea ʻo ka pahū ʻana mai ka plasma hiki ke alakaʻi i ka pōʻino nui i ke daimana. Ua hoʻoulu ʻia nā kiʻi daimana polycrystalline me ka hoʻohana ʻana i ka plasma i hoʻokomo ʻia i ka RF ma lalo o nā kūlana deposition e like me ka microwave plasma CVD. Ua loaʻa pū kekahi mau kiʻi daimana epitaxial homogeneous me ka hoʻohana ʻana i ka RF-induced plasma-enhanced CVD.

(4) DC Plasma CVD

ʻO DC plasma kekahi ala ʻē aʻe o ka hoʻoulu ʻana i kahi kumu kinoea (maʻamau ka hui ʻana o H2, a me ke kinoea hydrocarbon) no ka ulu ʻana o ke kiʻi daimana. mm/h. Eia kekahi, no ka mea hiki i nā ʻano hana DC arc ke waiho i nā kiʻi ʻoniʻoni daimana kiʻekiʻe ma nā substrates non-diamond ma nā kumukūʻai deposition kiʻekiʻe, hāʻawi lākou i kahi ala kūʻai no ka waiho ʻana o nā kiʻi daimana.

(5) Electron cyclotron resonance microwave plasma enhanced chemical vapor deposition (ECR-MPECVD) ʻO ka plasma DC, ka plasma RF, a me ka microwave plasma i wehewehe mua ʻia e hoʻokaʻawale a hoʻoheheʻe i ka H2, a i ʻole hydrocarbons, i loko o nā pūʻulu atomika atomic a me carbon-hydrogen atom, no laila e hāʻawi i ke kūkulu ʻana i nā kiʻi ʻoniʻoni daimana. No ka mea hiki i ka electron cyclotron resonance plasma ke hana i ka plasma kiʻekiʻe (> 1x1011cm-3), ʻoi aku ka maikaʻi o ka ECR-MPECVD no ka ulu ʻana a me ka waiho ʻana o nā kiʻi daimana.

-Ua hoʻokuʻu ʻia kēia ʻatikala e ka mea hana mīkini hoʻoheheʻe vacuum Guangdong Zhenhua