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Ubuchwepheshe bokufaka i-ion

Umthombo we-athikili:I-vacuum ye-Zhenhua
Funda:10
Kushicilelwe:22-11-08

Isici esiyinhloko sendlela yokuhwamuka kwe-vacuum yokufaka amafilimu izinga eliphezulu lokubeka.Isici esiyinhloko sendlela ye-sputtering ububanzi bezinto zefilimu ezitholakalayo kanye nokufana okuhle kwesendlalelo sefilimu, kodwa izinga lokubeka liphansi.I-ion coating iyindlela ehlanganisa lezi zinqubo ezimbili.

Isimiso se-ion coating kanye nezimo zokwakheka kwefilimu
Umgomo wokusebenza we-ion coating ukhonjiswe ku-Pic.Igumbi le-vacuum limpontshelwa kumfutho ongaphansi kuka-10-4 Pa, bese ligcwaliswa ngegesi engasebenzi (isb. i-argon) kungcindezi engu-0.1 ~ 1 Pa. Ngemuva kokuthi i-voltage ye-DC engalungile efika ku-5 kV isetshenziswa ku-substrate, i-a. indawo ye-plasma enengcindezi ephansi yokukhanya kwegesi isungulwa phakathi kwe-substrate ne-crucible.I-ion yegesi ye-inert isheshisa inkambu kagesi futhi ibhomu ebusweni be-substrate, ngaleyo ndlela ihlanza ubuso bomsebenzi.Ngemuva kokuthi le nqubo yokuhlanza isiqediwe, inqubo yokumboza iqala ngokushisa kwezinto okumele zifakwe ku-crucible.Izinhlayiya ze-vaporized vaporized zingena endaweni ye-plasma futhi zishayisane nama-ion angenayo angenayo nama-electron ahlukanisiwe, futhi ezinye izinhlayiya zomhwamuko ziyahlukaniswa futhi ziqhume ucezu lokusebenzela kanye nendawo enamathelayo ngaphansi kokusheshisa kwensimu kagesi.Enqubweni yokucwenga kwe-ion, akukhona nje ukubekelwa phansi kodwa futhi nokufafazwa kwama-ion aqondile ku-substrate, ngakho-ke ifilimu elizacile lingakhiwa kuphela uma umthelela we-deposition mkhulu kunomphumela wokufafaza.

Ubuchwepheshe bokufaka i-ion

Inqubo yokumboza i-ion, lapho i-substrate ihlale igcwele ama-ion anamandla amakhulu, ihlanzeke kakhulu futhi inezinzuzo eziningi uma iqhathaniswa ne-sputtering kanye ne-evaporation coating.

(1)Ukunamathela okuqinile, ungqimba olunamathelayo aluqedwa kalula.
(a)Enqubweni yokwemboza i-ion, inani elikhulu lezinhlayiya ezinamandla aphezulu ezikhiqizwe ukukhishwa okukhanyayo zisetshenziselwa ukukhiqiza umphumela we-cathodic sputtering ebusweni be-substrate, ukuphalaza nokuhlanza igesi namafutha adsorbed ebusweni be-substrate. i-substrate yokuhlanza indawo ye-substrate kuze kube yilapho yonke inqubo yokumboza isiqediwe.
(b)Esigabeni sokuqala sokumboza, ukuphalaza kanye nokubeka kuhlangana ndawonye, ​​okungakha ungqimba olushintshayo lwezingxenye ekuxhumaneni kwesisekelo sefilimu noma ingxube yento yefilimu nezinto eziyisisekelo, ezibizwa “ngesendlalelo se-pseudo-diffusion”, okungathuthukisa ngokuphumelelayo ukusebenza kokunamathela kwefilimu.
(2)Izindawo ezinhle zokugoqa.Esinye sezizathu ukuthi ama-athomu ezinto zokumboza afakwa ionized ngaphansi kwengcindezi ephezulu futhi ashayisane nama-molecule egesi izikhathi eziningana phakathi nenqubo yokufinyelela ku-substrate, ukuze ama-ion wezinto zokumboza ahlakazeke azungeze i-substrate.Ngaphezu kwalokho, ama-athomu e-ionized coating afakwa ebusweni be-substrate ngaphansi kwesenzo sensimu kagesi, ngakho-ke yonke i-substrate ifakwe ngefilimu encane, kodwa ukuhwamuka kwe-evaporation akukwazi ukufeza lo mphumela.
(3)Ikhwalithi ephezulu yokwemboza ingenxa yokufafaza kwama-condensate okubangelwa ukuqhunyiswa kwamabhomu okuqhubekayo kwefilimu efakwe ngama-ion aqondile, okuthuthukisa ukuminyana kongqimba.
(4) Ukukhethwa okubanzi kwezinto zokumboza nama-substrates kungambozwa ezintweni ezinsimbi noma ezingezona ezensimbi.
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Ukungalungi kokugqoka kwe-ion yilezi: ubukhulu befilimu abukwazi ukulawulwa ngokunembile;ukuhlushwa kweziphambeko kuphezulu lapho kudingeka ukunamathela okuhle;namagesi azongena ebusweni ngesikhathi sokumboza, okuzoshintsha izakhiwo ezingaphezulu.Kwezinye izimo, ama-cavities nama-nuclei (ngaphansi kwe-1 nm) nawo akhiwa.

Ngokuqondene nesilinganiso sokubeka, ukunamathela kwe-ion kuqhathaniswa nendlela yokuhwamuka.Ngokuqondene nekhwalithi yefilimu, amafilimu akhiqizwa ukumbozwa kwe-ion aseduze noma angcono kunalawo alungiselelwe ngokufafaza.


Isikhathi sokuthumela: Nov-08-2022