Isi ihe dị na ụzọ ikuku na-amịpụta ihe maka itinye ihe nkiri bụ oke ọnụego nchekwa ihe. Isi ihe dị na ụzọ sputtering bụ ọtụtụ ihe nkiri dị na ya na ezigbo nha nha nke oyi akwa ihe nkiri ahụ, mana ọnụego nchekwa ihe dị ala. Mkpuchi ion bụ usoro nke na-ejikọta usoro abụọ a.
Ụkpụrụ mkpuchi ion na ọnọdụ nhazi ihe nkiri
E gosiri ụkpụrụ ọrụ nke mkpuchi ion na Pic. A na-awụpụ ụlọ vacuum ahụ ruo nrụgide dị n'okpuru 10-4 Pa, wee jupụta ya na gas inert (dịka ọmụmaatụ argon) ruo nrụgide nke 0.1~1 Pa. Mgbe etinyere voltaji DC na-adịghị mma nke ruru 5 kV na substrate ahụ, a na-etolite mpaghara plasma gas glow dị ala n'etiti substrate na crucible. A na-eme ka ion gas inert dị ngwa ngwa site na ubi eletriki ma na-agbagharị elu nke substrate ahụ, si otú a na-ehicha elu nke workpiece ahụ. Mgbe emechara usoro nhicha a, usoro mkpuchi ahụ na-amalite site na vaporization nke ihe a ga-ekpuchi na crucible. Mkpụrụ vapor ndị a gbazere agbaze na-abanye na mpaghara plasma ma na-asọkọta na ion na electrons ndị a gbazere agbaze, ụfọdụ n'ime mkpụrụ vapor ahụ na-ekewapụ ma na-agbagharị na workpiece na elu mkpuchi ahụ n'okpuru ọsọ nke ubi eletrik. N'ime usoro mkpuchi ion, ọ bụghị naanị nkwụnye kamakwa ịgbasa ion dị mma na substrate ahụ, yabụ enwere ike ịmepụta ihe nkiri dị gịrịgịrị naanị mgbe mmetụta nkwụnye ahụ karịrị mmetụta sputtering ahụ.
Usoro mkpuchi ion, nke a na-eji ion ike dị elu eme ihe mgbe niile, dị ọcha nke ukwuu ma nwee ọtụtụ uru ma e jiri ya tụnyere mkpuchi sputtering na evaporation.
(1) Ike adhesion, mkpuchi oyi akwa anaghị agbawa ngwa ngwa.
(a) N'ime usoro mkpuchi ion, a na-eji ọtụtụ ihe ndị nwere ike dị elu nke ihe na-enwu enwu na-emepụta iji mepụta mmetụta sputtering cathodic n'elu ihe na-amị amị, na-agbasa ma na-ehicha gas na mmanụ a gwakọtara n'elu ihe na-amị amị iji mee ka elu ihe na-amị amị dị ọcha ruo mgbe usoro mkpuchi ahụ zuru oke.
(b) Na mbido mkpuchi, sputtering na deposition na-ejikọta ọnụ, nke nwere ike ịmepụta oyi akwa mgbanwe nke ihe ndị dị na njikọ nke isi ihe nkiri ahụ ma ọ bụ ngwakọta nke ihe nkiri ahụ na ihe ndabere, nke a na-akpọ "pseudo-diffusion layer", nke nwere ike ime ka arụmọrụ njikọta nke ihe nkiri ahụ ka mma nke ọma.
(2) Ezigbo ihe mkpuchi gburugburu. Otu ihe kpatara ya bụ na a na-eme ka atọm ihe mkpuchi ahụ dị ka ion n'okpuru nrụgide dị elu ma na-adakọ na molekul gas ọtụtụ oge n'oge usoro iru ihe mkpuchi ahụ, ka ion ihe mkpuchi ahụ wee nwee ike ịgbasa gburugburu ihe mkpuchi ahụ. Na mgbakwunye, a na-etinye atọm ihe mkpuchi ionized n'elu ihe mkpuchi ahụ n'okpuru ọrụ nke ubi eletriki, yabụ a na-etinye ihe mkpuchi ahụ dum na fim dị gịrịgịrị, mana mkpuchi evaporation enweghị ike imezu mmetụta a.
(3) Ọdịdị dị elu nke mkpuchi ahụ bụ n'ihi mmụba nke condensates nke sitere na bọmbụ mgbe niile nke ihe nkiri ahụ e tinyere na ion dị mma, nke na-eme ka njupụta nke oyi akwa mkpuchi ahụ ka mma.
(4) Enwere ike itinye ọtụtụ ihe mkpuchi na ihe ndị dị n'elu ihe ndị e ji ígwè ma ọ bụ ihe ndị na-abụghị ọla kpuchie ha.
(5) Ma e jiri ya tụnyere ihe nchekwa anwụrụ kemịkalụ (CVD), ọ nwere obere okpomọkụ substrate, nke na-adịkarị n'okpuru 500°C, mana ike nrapado ya yiri nke ihe nkiri nchekwa anwụrụ kemịkalụ.
(6) Oke ntinye ego, nhazi ihe nkiri ngwa ngwa, ma nwee ike ikpuchi ọkpụrụkpụ nke ihe nkiri site na iri puku nanomita ruo microns.
Ihe ọghọm dị na mkpuchi ion bụ: enweghị ike ịchịkwa ọkpụrụkpụ nke ihe nkiri ahụ nke ọma; oke ntụpọ dị elu mgbe achọrọ mkpuchi dị mma; gas ga-abanyekwa n'elu ya n'oge mkpuchi ahụ, nke ga-agbanwe njirimara elu ya. N'ọnọdụ ụfọdụ, a na-emepụta oghere na nuclei (ihe na-erughị 1 nm).
Maka ọnụego ntinye, mkpuchi ion yiri usoro mwepụ. Banyere ịdị mma nke ihe nkiri ahụ, ihe nkiri ndị e ji mkpuchi ion mepụta dị nso ma ọ bụ ka mma karịa ndị e ji sputtering kwadebe.
Oge ozi: Nọvemba-08-2022