Chinhu chikuru chekushandisa nzira yekubvisa mhepo muvacuum yekuisa mafirimu ndechekuti ine mwero wepamusoro wekuisa mafirimu. Chinhu chikuru chekushandisa nzira yekubvisa firimu ndechekuti ine mhando dzakasiyana dzezvinhu zvefirimu zviripo uye kuti firimu iri rakafanana zvakanaka, asi mwero wekuisa firimu wakaderera. Kuvhara maion inzira inosanganisa maitiro maviri aya.
Pfungwa yekuputira ion uye mamiriro ekuumbwa kwefirimu
Nheyo yekushanda kwe ion coating inoratidzwa muPic. Kamuri re vacuum rinopombwa kusvika pa pressure iri pasi pe 10-4 Pa, uye rozozadzwa ne inert gas (semuenzaniso argon) kusvika pa pressure ye 0.1 ~ 1 Pa. Mushure mekunge DC voltage inosvika 5 kV yaiswa pa substrate, gasi rinopenya kusvika pa 5 kV rinobuda pakati pe substrate ne crucible. Ma inert gas ions anokurumidziswa ne electric field uye anoputira pamusoro pe substrate, nokudaro achichenesa pamusoro pe workpiece. Mushure mekunge maitiro aya ekuchenesa apera, maitiro e coating anotanga nekupfuta kwezvinhu zvinofanira kuputirwa mu crucible. Ma vapor particles anopinda mu plasma zone uye anogumburana nema dissociated inert positive ions nema electron, uye mamwe ma vapor particles anoputsika uye anoputira workpiece ne coating surface pasi pekukurumidzira kwe electric field. Mukuita kwekuisa ma ion plating, hapana kungoisa ma positive ions chete asiwo kudira ma positive ions pa substrate, saka firimu rakatetepa rinogona kuumbwa chete kana deposition effect yakakura kupfuura sputtering effect.
Maitiro ekuputira maion, apo substrate inogara ichizadzwa nemaion ane simba rakawanda, akachena kwazvo uye ane mabhenefiti akawanda kana tichienzanisa nekuputira maion ne evaporation.
(1) Yakasimba, jira rekufukidza haribvi nyore.
(a) Mukuita kwekuisa maion coating, huwandu hwakawanda hwezvimedu zvine simba rakawanda zvinogadzirwa nekubuda kwechiedza zvinoshandiswa kugadzira cathodic sputtering effect pamusoro pe substrate, sputtering nekuchenesa gasi nemafuta zvakanyungudutswa pamusoro pe substrate kuchenesa pamusoro pe substrate kusvika maitiro ese ekuisa ma ion apera.
(b) Pakutanga kwekuputira, kusvipa nekuiswa kwechinhu kunoitika pamwe chete, izvo zvinogona kugadzira chikamu chekuchinja chezvikamu panzvimbo yechikamu chefirimu kana musanganiswa wezvinhu zvefirimu nezvinhu zvepakutanga, zvinonzi "pseudo-diffusion layer", izvo zvinogona kuvandudza mashandiro ekunamatira kwefirimu.
(2) Hunhu hwakanaka hwekuputira. Chimwe chikonzero ndechekuti maatomu epurasitiki anoiswa maion pasi pekumanikidzwa kwakanyanya uye anobonderana nemamorekuru egasi kakawanda panguva yekusvika pasi pevhu, kuitira kuti maion epurasitiki akwanise kupararira akatenderedza pasi pevhu. Pamusoro pezvo, maatomu epurasitiki anoiswa pamusoro pevhu pasi pesimba remagetsi, saka pasi rese rinoiswa nefirimu rakatetepa, asi evaporation coating haigone kuita izvi.
(3) Hunhu hwepamusoro hwekuputira hunokonzerwa nekupfapfaidza kwemacondensate kunokonzerwa nekuputirwa nguva dzose kwefirimu rakaiswa nemaion akanaka, izvo zvinovandudza huwandu hwechikamu chekuputira.
(4) Zvinhu zvakasiyana-siyana zvekuputira uye substrates zvinogona kuputirwa pazvinhu zvesimbi kana zvisiri zvesimbi.
(5) Kana ichienzaniswa ne chemical vapor deposition (CVD), ine tembiricha yakaderera ye substrate, inowanzo pasi pe500°C, asi simba rayo rekunamatira rakafanana zvizere nemafirimu e chemical vapor deposition.
(6) Kuwanda kwekuisa firimu, kugadzirwa kwefirimu nekukurumidza, uye kugona kufukidza ukobvu hwemafirimu kubva pamakumi ema nanometers kusvika kuma microns.
Zvakashata zve ion coating ndeizvi: ukobvu hwefirimu hahugone kudzorwa nemazvo; huwandu hwezvikanganiso hwakanyanya kana zvidimbu zvidiki zvichidikanwa; uye magasi anopinda pamusoro panguva yekupenda, izvo zvinochinja hunhu hwepamusoro. Mune zvimwe zviitiko, maburi nemanuclei (asingasviki 1 nm) anoumbwawo.
Kana iri yehuwandu hwema "deposition rate", "ion coating" inofananidzwa nenzira ye "evaporation". Kana iri yemhando yefirimu, mafirimu anogadzirwa ne "ion coating" ari pedyo kana kuti ari nani pane akagadzirwa nekusputter.
Nguva yekutumira: Mbudzi-08-2022