Kev siv tshuab txheej ion

Qhov tseem ceeb ntawm txoj kev nqus tsev vacuum evaporation rau kev tso cov yeeb yaj kiab yog qhov siab deposition rate. Qhov tseem ceeb ntawm txoj kev sputtering yog ntau yam ntawm cov ntaub ntawv zaj duab xis muaj thiab qhov zoo sib xws ntawm cov txheej zaj duab xis, tab sis qhov deposition rate qis. Ion txheej yog ib txoj kev uas muab ob txoj kev no ua ke.

Txoj cai txheej ion thiab cov xwm txheej tsim zaj duab xis
Lub hauv paus ntsiab lus ua haujlwm ntawm ion txheej tau qhia hauv Pic. Lub chamber nqus tsev raug pumped rau qhov siab hauv qab 10-4 Pa, thiab tom qab ntawd puv nrog cov roj inert (piv txwv li argon) rau qhov siab ntawm 0.1 ~ 1 Pa. Tom qab lub zog DC tsis zoo txog li 5 kV raug siv rau lub substrate, lub plasma cheeb tsam tso tawm roj qis siab tau tsim ntawm lub substrate thiab lub crucible. Cov roj inert ions raug nrawm los ntawm lub zog hluav taws xob thiab bombard qhov chaw ntawm lub substrate, yog li ntxuav qhov chaw ntawm lub workpiece. Tom qab cov txheej txheem ntxuav no tiav lawm, cov txheej txheem txheej pib nrog kev ua pa ntawm cov khoom siv uas yuav tsum tau coated hauv lub crucible. Cov pa dej vaporized nkag mus rau hauv plasma cheeb tsam thiab sib tsoo nrog cov ions inert positive thiab electrons uas tau dissociated, thiab qee cov pa dej particles raug dissociated thiab bombard lub workpiece thiab qhov chaw txheej hauv qab qhov kev nrawm ntawm lub zog hluav taws xob. Hauv cov txheej txheem ion plating, tsis yog tsuas yog muaj kev tso dej xwb tab sis kuj muaj kev tawg ntawm cov ions zoo rau ntawm lub substrate, yog li cov zaj duab xis nyias tuaj yeem tsim tau tsuas yog thaum cov nyhuv tso dej ntau dua li cov nyhuv sputtering.

Cov txheej txheem ion txheej, uas lub substrate yeej ib txwm raug foob nrog cov ions muaj zog siab, yog huv heev thiab muaj ntau qhov zoo piv rau sputtering thiab evaporation txheej.

(1) Muaj zog nplaum, txheej txheej tsis tev tawm yooj yim.
(a) Hauv cov txheej txheem ion txheej, ntau cov khoom siv hluav taws xob siab uas tsim los ntawm kev tso tawm lub teeb ci tau siv los tsim cov nyhuv cathodic sputtering rau ntawm qhov chaw ntawm lub substrate, sputtering thiab ntxuav cov roj thiab roj adsorbed rau ntawm qhov chaw ntawm lub substrate kom ntxuav lub substrate nto kom txog thaum tag nrho cov txheej txheem txheej txheem tiav.
(b) Thaum ntxov ntawm txheej, sputtering thiab deposition coexist, uas tuaj yeem tsim ib txheej hloov pauv ntawm cov khoom ntawm qhov sib txuas ntawm lub hauv paus zaj duab xis lossis kev sib xyaw ntawm cov khoom siv zaj duab xis thiab cov khoom siv hauv paus, hu ua "pseudo-diffusion txheej", uas tuaj yeem txhim kho kev ua tau zoo ntawm zaj duab xis.
(2) Cov yam ntxwv zoo qhwv ncig. Ib qho laj thawj yog vim tias cov khoom siv txheej txheej yog ionized nyob rau hauv siab siab thiab sib tsoo nrog cov roj molecules ntau zaus thaum lub sijhawm mus txog lub substrate, yog li cov khoom siv txheej txheej ions tuaj yeem tawg thoob plaws lub substrate. Tsis tas li ntawd, cov khoom siv txheej txheej ionized atoms raug tso rau ntawm qhov chaw ntawm lub substrate nyob rau hauv qhov kev ua ntawm lub teb hluav taws xob, yog li tag nrho lub substrate raug tso nrog ib zaj duab xis nyias, tab sis cov txheej evaporation tsis tuaj yeem ua tiav qhov no.
(3) Qhov zoo ntawm cov txheej yog vim muaj cov dej ntws los ntawm cov dej ntws los ntawm kev sib tsoo tas li ntawm cov zaj duab xis uas tau tso nrog cov ions zoo, uas ua rau qhov ceev ntawm cov txheej txheej zoo dua.
(4) Muaj ntau yam khoom siv txheej thiab cov substrates uas tuaj yeem coated rau ntawm cov hlau lossis cov khoom tsis yog hlau.
(5) Piv rau cov tshuaj lom neeg vapor deposition (CVD), nws muaj qhov kub qis dua, feem ntau qis dua 500 ° C, tab sis nws lub zog lo yog sib piv tag nrho rau cov yeeb yaj kiab tshuaj lom neeg vapor deposition.
(6) Tus nqi tso tawm siab, kev tsim zaj duab xis ceev, thiab tuaj yeem txheej tuab ntawm cov yeeb yaj kiab los ntawm kaum tawm nanometers mus rau microns.

Qhov tsis zoo ntawm cov txheej ion yog: qhov tuab ntawm zaj duab xis tsis tuaj yeem tswj tau meej; qhov concentration ntawm cov qhov tsis zoo yog siab thaum xav tau txheej zoo; thiab cov pa roj yuav nkag mus rau hauv qhov chaw thaum lub sijhawm txheej, uas yuav hloov cov yam ntxwv ntawm qhov chaw. Hauv qee kis, cov qhov thiab cov nuclei (tsawg dua 1 nm) kuj tseem tsim.

Raws li qhov nrawm ntawm kev tso cov ion, cov txheej ion zoo ib yam li txoj kev evaporation. Raws li qhov zoo ntawm zaj duab xis, cov zaj duab xis uas tsim los ntawm cov txheej ion yog ze rau lossis zoo dua li cov uas tau npaj los ntawm kev sputtering.