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Ion txheej technology

Qhov chaw: Zhenhua nqus tsev
Nyeem: 10
Luam tawm: 22-11-08

Lub ntsiab feature ntawm lub tshuab nqus tsev evaporation txoj kev rau depositing films yog lub siab deposition tus nqi.Lub ntsiab feature ntawm sputtering txoj kev yog ntau yam ntawm cov ntaub ntawv uas muaj zaj duab xis thiab cov zoo uniformity ntawm zaj duab xis txheej, tab sis tus deposition tus nqi yog tsawg.Ion txheej yog ib txoj kev uas ua ke ob txoj kev no.

Ion txheej txheej txheem thiab cov txheej txheem tsim zaj duab xis
Lub hauv paus ntsiab lus ua haujlwm ntawm ion txheej yog qhia hauv Pic.Lub tshuab nqus tsev vacuum yog pumped mus rau lub siab qis dua 10-4 Pa, thiab tom qab ntawd ntim nrog cov roj inert (xws li argon) mus rau lub siab ntawm 0.1 ~ 1 Pa. Tsis tshua muaj siab gas glow paug plasma cheeb tsam yog tsim los ntawm lub substrate thiab crucible.Cov roj inert ions yog nrawm los ntawm lub tshav pob hluav taws xob thiab foob pob rau saum npoo ntawm lub substrate, yog li ntxuav qhov chaw ntawm lub workpiece.Tom qab cov txheej txheem no ua tiav, txheej txheej txheej pib nrog vaporization ntawm cov khoom yuav tsum tau coated nyob rau hauv lub crucible.Cov vaporized vapor hais nkag mus rau hauv plasma cheeb tsam thiab sib tsoo nrog cov dissociated inert zoo ions thiab electrons, thiab ib co ntawm cov vapor hais dissociated thiab bombard lub workpiece thiab txheej txheej nyob rau hauv lub acceleration ntawm hluav taws xob teb.Nyob rau hauv cov txheej txheem ion plating, tsis yog tsuas yog deposition tab sis kuj sputtering ntawm zoo ions ntawm lub substrate, yog li lub nyias zaj duab xis yuav tsim tau tsuas yog thaum lub deposition nyhuv yog ntau dua li cov nyhuv sputtering.

Ion txheej technology

Cov txheej txheem ion txheej, uas lub substrate yeej ib txwm bombarded nrog high-zog ions, yog huv si thiab muaj ib tug xov tooj ntawm zoo piv rau sputtering thiab evaporation txheej.

(1) Muaj zog adhesion, txheej txheej tsis tev tawm yooj yim.
(a) Nyob rau hauv cov txheej txheem txheej txheej ion, ntau cov khoom siv hluav taws xob ntau uas tsim los ntawm lub ntsej muag ci yog siv los tsim cov nyhuv cathodic sputtering rau ntawm qhov chaw ntawm lub substrate, sputtering thiab ntxuav cov roj thiab roj adsorbed rau ntawm qhov chaw. substrate los ntxuav lub substrate nto kom txog thaum tag nrho cov txheej txheem txheej tiav.
(b) Thaum ntxov txheej txheej, sputtering thiab deposition coexist, uas muaj peev xwm tsim ib tug kev hloov txheej txheej ntawm cov khoom nyob rau hauv lub interface ntawm zaj duab xis puag los yog ib tug sib tov ntawm cov ntaub ntawv zaj duab xis thiab lub hauv paus khoom, hu ua "pseudo-diffusion txheej", uas tuaj yeem txhim kho qhov kev ua tau zoo ntawm cov yeeb yaj kiab.
(2) Cov khoom ntim zoo.Ib qho laj thawj yog vim li cas cov khoom siv txheej atoms yog ionized nyob rau hauv lub siab thiab sib tsoo nrog cov roj molecules ob peb zaug thaum lub sij hawm tus txheej txheem ntawm ncav lub substrate, thiaj li hais tias cov txheej txheej ions yuav tawg nyob ib ncig ntawm lub substrate.Tsis tas li ntawd, cov khoom siv ionized txheej atoms tso rau ntawm qhov chaw ntawm lub substrate nyob rau hauv qhov kev txiav txim ntawm hluav taws xob teb, yog li tag nrho cov substrate yog deposited nrog ib tug nyias zaj duab xis, tab sis evaporation txheej tsis tuaj yeem ua tiav cov nyhuv no.
(3) Qhov zoo ntawm cov txheej yog vim qhov sputtering ntawm condensates tshwm sim los ntawm qhov tsis tu ncua ntawm lub foob pob ntawm cov yeeb yaj kiab tso nrog cov ions zoo, uas txhim kho qhov ntom ntawm txheej txheej.
(4) Kev xaiv dav ntawm cov ntaub ntawv txheej thiab cov substrates tuaj yeem coated ntawm cov khoom siv hlau lossis cov hlau tsis yog hlau.
(5) Muab piv rau cov tshuaj vapor deposition (CVD), nws muaj ib tug qis substrate kub, feem ntau qis dua 500 ° C, tab sis nws lub zog adhesion yog tag nrho piv rau cov tshuaj vapor deposition films.
(6) High deposition tus nqi, ceev ceev tsim zaj duab xis, thiab muaj peev xwm txheej thickness ntawm cov zaj duab xis los ntawm kaum nanometers rau microns.

Qhov tsis zoo ntawm ion txheej yog: lub thickness ntawm zaj duab xis tsis tuaj yeem tswj tau qhov tseeb;qhov concentration ntawm qhov tsis xws luag yog siab thaum yuav tsum tau txheej zoo;thiab gases yuav nkag mus rau saum npoo thaum txheej txheej, uas yuav hloov cov khoom nto.Qee zaum, kab noj hniav thiab nuclei (tsawg dua 1 nm) kuj raug tsim.

Raws li rau deposition tus nqi, ion txheej yog piv rau txoj kev evaporation.Raws li rau cov yeeb yaj kiab zoo, cov yeeb yaj kiab uas tsim los ntawm ion txheej yog ze rau lossis zoo dua li cov uas tau npaj los ntawm sputtering.


Post lub sij hawm: Nov-08-2022