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Izici zokugqoka i-magnetron sputtering Isahluko 2

Umthombo wesihloko: I-vacuum ye-Zhenhua
Funda: 10
Kushicilelwe: 23-12-01

Izici ze-magnetron sputtering coating

(3) Ukuphalaza kwamandla aphansi. Ngenxa ye-voltage ephansi ye-cathode esetshenziswa ekuhlosweni, i-plasma iboshwe yinsimu yamagnetic esikhaleni esiseduze ne-cathode, ngaleyo ndlela ivimbela izinhlayiya ezishaja amandla aphezulu ohlangothini lwe-substrate abantu abadubule. Ngakho-ke, izinga lomonakalo kwi-substrate njengamadivayisi e-semiconductor abangelwa ukuqhunyiswa kwezinhlayiya ezishaja liphansi kunalelo elibangelwa ezinye izindlela zokuphalaza.

微信图片_20231201111637

(4) Izinga lokushisa eliphansi le-substrate. Izinga lokuphalaza kwe-Magnetron sputtering liphezulu, ngoba i-cathode target ensimini yamagnetic ngaphakathi kwesifunda, okungukuthi, indlela yokukhipha i-target ngaphakathi kwendawo encane yendawo yokugcwala kwe-electron iphezulu, kuyilapho ku-magnetic effect ngaphandle kwesifunda, ikakhulukazi kude nensimu yamagnetic ebusweni be-substrate eseduze, ukugcwala kwe-electron ngenxa yokusabalala kwe-substrate ephansi kakhulu, futhi kungase kube ngaphansi kune-dipole sputtering (ngenxa yomehluko phakathi kwengcindezi yegesi esebenzayo emibili yomyalo wobukhulu). Ngakho-ke, ngaphansi kwezimo zokuphalaza kwe-magnetron, ukugcwala kwama-electron aqhuma ebusweni be-substrate kuphansi kakhulu kunalokho ekuphalazeni kwe-diode evamile, futhi ukwanda okukhulu kwezinga lokushisa le-substrate kuyagwenywa ngenxa yokunciphisa inani lama-electron ayenzekayo ku-substrate. Ngaphezu kwalokho, endleleni yokuphalaza i-magnetron, i-anode yedivayisi yokuphalaza i-magnetron ingatholakala eduze kwe-cathode, futhi isibambi se-substrate singavulwa futhi sibe namandla okumiswa, ukuze ama-electron angadluli esibambini se-substrate esisekelwe phansi futhi ageleze nge-anode, ngaleyo ndlela enze ama-electron anamandla aphezulu ahlasela i-substrate efakwe insimbi anciphe, kunciphisa ukwanda kokushisa kwe-substrate okubangelwa ama-electron, futhi kunciphisa kakhulu ukuphalaza kwe-electron yesibili ye-substrate okuholela ekukhiqizweni kokushisa.

(5) Ukuqoshwa okungalingani kwethagethi. Kuthagethi yendabuko yokuqoshwa kwe-magnetron, ukusetshenziswa kwensimu yamagnetic engalingani, ngakho-ke i-plasma izokhiqiza umphumela wokuhlangana kwendawo, kuzokwenza ithagethi endaweni yendawo yesilinganiso sokuqoshwa kokuqoshwa ibe nkulu, umphumela uba ukuthi ithagethi izokhiqiza ukuqoshwa okungalingani okukhulu. Izinga lokusetshenziswa kwethagethi ngokuvamile licishe libe ngu-30%. Ukuze uthuthukise izinga lokusetshenziswa kwezinto eziqondiwe, ungathatha izinyathelo ezahlukahlukene zokuthuthukisa, njengokuthuthukisa ukuma nokusatshalaliswa kwensimu yamagnetic eqondiwe, ukuze i-magnet ekuqondisweni ikwazi ukudonsa ukunyakaza kwangaphakathi nokunye.

Ubunzima ekusakazeni amatshe ezinto ezisebenza ngogesi. Uma itshe elisebenza ngogesi lenziwe ngezinto ezikwazi ukungena kalula emanzini, imigqa yamandla kazibuthe izodlula ngqo ngaphakathi kwetshe ukuze kwenzeke isenzakalo se-magnetic short-circuit, okwenza kube nzima ukukhipha i-magnetron. Ukuze kukhiqizwe insimu kazibuthe yesikhala, abantu benze izifundo ezahlukahlukene, isibonelo, ukuze bagcwalise insimu kazibuthe ngaphakathi kwetshe elisebenza ngogesi, okushiya izikhala eziningi kutshe ukuze kukhuthazwe ukukhiqizwa kokuvuza okwengeziwe kokushisa kwezinga kazibuthe, noma ukunciphisa ukungena kwamandla kazibuthe kwezinto ezisetshenziswa ngogesi.

–Lesi sihloko sikhishwe yi-umenzi womshini wokumboza nge-vacuumI-Guangdong Zhenhua


Isikhathi sokuthunyelwe: Disemba-01-2023