Hunhu hwe magnetron sputtering unhani
(3) Kupupira simba shoma. Nekuda kwe cathode voltage yakaderera inoshandiswa pachinangwa, plasma inosungwa nesimba remagineti riri munzvimbo iri pedyo ne cathode, nokudaro ichidzivisa zvidimbu zvine simba rakawanda kudivi re substrate vanhu vakapfurwa. Nokudaro, mwero wekukuvadzwa kwe substrate senge semiconductor devices kunokonzerwa ne charged particle bombardment wakaderera pane unokonzerwa nedzimwe nzira dzepupira.
(4) Tembiricha yakaderera ye substrate. Mwero wekupukutira kwe magnetron sputtering wakakwira, nekuti chinangwa che cathode mumunda wemagineti mukati medunhu, ndiko kuti, nzira yekubuda nayo mukati menzvimbo diki yehuwandu hwemaerekitironi yakakwira, nepo mumhedzisiro yemagineti iri kunze kwedunhu, kunyanya kure nemunda wemagineti wepamusoro pe substrate iri pedyo, huwandu hwemaerekitironi nekuda kwekupararira kwepasi zvakanyanya, uye hunogona kutove hwakaderera pane dipole sputtering (nekuda kwemusiyano uripo pakati pesimba remagasi maviri anoshanda ehukuru hwakasiyana). Saka, pasi pemamiriro ekupukutira kwemagnetron, huwandu hwemaerekitironi anoputira pamusoro pe substrate hwakaderera zvikuru pane huri mupukutira we diode wakajairika, uye kuwedzera kwakanyanya kwekushisa kwe substrate kunodziviswa nekuda kwekudzikira kwehuwandu hwemaerekitironi anoitika pa substrate. Pamusoro pezvo, munzira ye magnetron sputtering, anode yechishandiso che magnetron sputtering inogona kuwanikwa yakatenderedza cathode, uye substrate holder inogonawo kufukurwa uye kuva ne suspension potential, kuitira kuti maerekitironi asapfuure nemuchibatiso che substrate chakaiswa pasi oyerera nepaanode, zvichiita kuti maerekitironi ane simba guru ari kuputira substrate yakaputirwa aderedzwe, zvichideredza kuwedzera kwekupisa kwe substrate kunokonzerwa nemaerekitironi, uye zvichideredza zvakanyanya secondary electron blasting ye substrate zvichikonzera kupisa.
(5) Kuchekwa kusina kuenzana kwechinangwa. Muchishandiswa chekare chemagnetron sputtering target, kushandiswa kwesimba remagineti risina kuenzana, saka plasma ichaburitsa mhedzisiro yekubatana kwenzvimbo, kuchaita kuti chinangwa panzvimbo yenzvimbo yemuchina we sputtering etching chive chikuru, mhedzisiro yacho ndeyekuti chinangwa chichaburitsa sputtering isina kuenzana. Chiyero chekushandiswa kwechinangwa chinowanzova 30%. Kuti uvandudze chiyero chekushandiswa kwechinhu chaunoda, unogona kutora matanho akasiyana-siyana ekuvandudza, akadai sekuvandudza chimiro nekupararira kwesimba remagineti raunoda, kuitira kuti magineti ari muchinangwa agone kufamba mukati nezvimwewo.
Kuoma kwekushandisa magineti pakuputira zvinangwa. Kana chinangwa chekuputira chakagadzirwa nezvinhu zvine simba remagineti rakakwira, simba remagineti richapfuura zvakananga nepakati pechinhu chinopinzwa kuti pave nechiitiko chemagnetic short-circuit, zvichiita kuti magnetron discharge iome. Kuti vagadzire simba remagineti remuchadenga, vanhu vakaita zvidzidzo zvakasiyana-siyana, semuenzaniso, kuti vazadze simba remagineti mukati mechinhu chinopinzwa, zvichisiya mipata yakawanda muchinangwa ichi kukurudzira kugadzirwa kwekubuda kwemvura yakawanda kubva mukupisa kwechinhu chinopinzwa, kana kuderedza kubvumidzwa kwesimba remagineti rechinhu chinopinzwa.
–Chinyorwa ichi chakaburitswa namugadziri wemuchina wevacuum coatingGuangdong Zhenhua
Nguva yekutumira: Zvita-01-2023