Hunhu hwemagnetron sputtering coating
(3) Kudonha kwesimba shoma. Nekuda kweiyo yakaderera cathode voltage inoshandiswa kune chinangwa, iyo plasma inosungwa neiyo magineti munzvimbo iri pedyo necathode, nekudaro ichivharira yakakwira-simba rinochaja zvidimbu kudivi re substrate vanhu vakapfurwa. Naizvozvo, dhigirii rekukuvadza kune substrate semiconductor zvishandiso zvinokonzerwa nechaji particle bombardment yakaderera pane iyo inokonzerwa nedzimwe nzira dzekupfira.
(4) Low substrate tembiricha. Magnetron sputtering sputtering rate yakakwira, nekuti cathode target in the magnetic field mukati medunhu, kureva kuti, tarisiro yekuburitsa runway mukati menzvimbo diki yenzvimbo ye electron concentration yakakwira, nepo mune magineti kunze kwedunhu, kunyanya kure nemagnetic field ye substrate surface iri padyo, iyo electron concentration nekuda kwekupararira kweiyo yakadzikira zvakanyanya, uye inogona kunge iri pakati peiyo dipobeca maviri. kushanda gasi kudzvinyirira kwehurongwa hwehukuru). Naizvozvo, pasi pemagineti yekupopotera, kuwanda kwemaerekitironi kuri kubhomba pamusoro pe substrate kwakadzikira pane kwakajairwa diode sputtering, uye kuwedzera kwakanyanya kwekushisa kwe substrate kunodzivirirwa nekuda kwekudzikira kwenhamba yemaerekitironi pane substrate. Mukuwedzera, mune magnetron sputtering nzira, anode yemagnetron sputtering device inogona kuwanikwa yakapoteredza cathode nharaunda, uye substrate holder inogonawo kusunungurwa uye mukusimudzirwa kwekugona, kuitira kuti maerekitironi arege kupfuura nepakati pepasi substrate holder uye inoyerera ichienda kuburikidza neanode, nokudaro zvichiita kuti bhomba rinoderedza simba riwedzere, kuderedza simba remagetsi. kupisa kunokonzerwa nemaerekitironi, uye kunoderedza zvakanyanya kubhomba kwechipiri kwerekitironi ye substrate zvichikonzera chizvarwa chekupisa.
(5) Kusaenzana kurongeka kwechinangwa. Muchinyakare magnetron sputtering tarisiro, kushandiswa kweiyo isina kuenzana magineti, saka plasma ichaburitsa yemuno convergence effect, ichaita kuti chinonangwa chiri panzvimbo yenzvimbo yesputtering etching rate ive yakanaka, mhedzisiro ndeyekuti chinangwa chinoburitsa yakakosha kusaenzana etching. Chiyero chekushandiswa kwechinangwa kazhinji chinenge 30%. Kuti uvandudze chiyero chekushandiswa kwezvinhu zvinotarirwa, unogona kutora matanho ekuvandudza akasiyana-siyana, akadai sekuvandudza chimiro uye kugoverwa kwechinangwa chemagnetic field, kuitira kuti magineti mune chinangwa cathode yemukati kufamba uye zvichingodaro.
Kuomerwa mukuburitsa magineti zvinhu zvinonangwa. Kana iyo sputtering target yakaitwa nechinhu chine high magnetic permeability, magineti mitsara yesimba ichapfuura yakananga mukati mechinangwa kuti paitike magnetic short-circuit phenomenon, nokudaro zvichiita kuti magnetron discharge yakaoma. Kuti vagadzire nzvimbo yemagineti, vanhu vakaita zvidzidzo zvakasiyana-siyana, semuenzaniso, kuzadzikisa magineti mukati mechinhu chakanangwa, vachisiya mikaha yakawanda muchinangwa kusimudzira kugadzirwa kwekuwanda kwekudonha kwemagineti tarisiro yekushisa kuwedzera, kana kuderedza magineti permeability yechinhu chakanangwa.
-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: Zvita-01-2023