ʻenehana uhi ion

ʻO ka hiʻohiʻona nui o ke ʻano evaporation vacuum no ka waiho ʻana i nā kiʻiʻoniʻoni ʻo ia ka helu deposition kiʻekiʻe. ʻO ka hiʻohiʻona nui o keʻano sputtering ka laulā o nā mea kiʻiʻoniʻoni i loaʻa a me ke kūlike maikaʻi o ka papa kiʻiʻoniʻoni, akā he haʻahaʻa ka helu deposition. ʻO ka uhi ʻana i ka Ion kahi ala e hoʻohui ai i kēia mau kaʻina hana ʻelua.

ʻO ka loina ka uhi ʻana o Ion a me nā kūlana hana kiʻiʻoniʻoni
Hōʻike ʻia ke kumu hana o ka uhi ion ma ka Pic. Hoʻopili ʻia ke keʻena ʻōpala i kahi kaomi ma lalo o 10-4 Pa, a laila hoʻopiha ʻia me ke kinoea inert (eg argon) i kahi kaomi o 0.1 ~ 1 Pa. Ma hope o ka hoʻopili ʻana o ka uila DC maikaʻi ʻole a hiki i ka 5 kV i ka substrate, ua hoʻokumu ʻia kahi wahi plasma hoʻokuʻu haʻahaʻa haʻahaʻa ma waena o ka substrate a me ka crucible. Hoʻonui ʻia nā ion kinoea inert e ke kahua uila a pahū i ka ʻili o ka substrate, pēlā e hoʻomaʻemaʻe ai i ka ʻili o ka mea hana. Ma hope o ka pau ʻana o kēia kaʻina hoʻomaʻemaʻe, hoʻomaka ke kaʻina hana me ka vaporization o ka mea e uhi ʻia i loko o ka crucible. Hoʻokomo ʻia nā ʻāpana mahu i loko o ka ʻāpana plasma a hui pū me nā ion positive inert a me nā electrons, a ua hoʻokaʻawale ʻia kekahi o nā ʻāpana mahu a hoʻopā i ka mea hana a me ka uhi uhi ma lalo o ka wikiwiki o ke kahua uila. Ma ke kaʻina hana hoʻoheheʻe ion, ʻaʻole wale ka deposition akā ʻo ka sputtering o nā ion maikaʻi ma luna o ka substrate, no laila hiki ke hana ʻia ke kiʻi ʻoniʻoni wale nō ke ʻoi aku ka hopena deposition ma mua o ka hopena sputtering.

ʻO ke kaʻina hana hoʻoheheʻe ion, kahi e hoʻopiʻi mau ʻia ai ka substrate me nā ion ikehu kiʻekiʻe, he maʻemaʻe loa a he nui nā mea maikaʻi i hoʻohālikelike ʻia i ka sputtering a me ka uhi evaporation.

(1) Adhesion ikaika, ʻaʻole ʻili maʻalahi ka papa uhi.
(a) I ke kaʻina hana hoʻoheheʻe ion, hoʻohana ʻia ka nui o nā ʻāpana ikaika kiʻekiʻe e ka hoʻokuʻu ʻana o ka glow e hana i ka hopena cathodic sputtering ma ka ʻili o ka substrate, sputtering a me ka hoʻomaʻemaʻe ʻana i ke kinoea a me ka aila i hoʻopili ʻia ma ka ʻili o ka substrate e hoʻomaʻemaʻe i ka ʻili o ka substrate a pau ke kaʻina hana uhi.
(b) I ka hoʻomaka ʻana o ka uhi, sputtering a me ka deposition coexist, hiki ke hana i kahi papa hoʻololi o nā ʻāpana ma ke kikowaena o ka waihona kiʻiʻoniʻoni a i ʻole ka hui ʻana o ka mea kiʻiʻoniʻoni a me ka mea kumu, i kapa ʻia ʻo "pseudo-diffusion layer", hiki ke hoʻomaikaʻi maikaʻi i ka hana adhesion o ke kiʻi.
(2) ʻO nā waiwai ʻōwili maikaʻi. Hoʻokahi kumu, ua hoʻokaʻawale ʻia nā ʻātoma mea uhi ma lalo o ke kaomi kiʻekiʻe a hui pū me nā molekole kinoea i nā manawa he nui i ke kaʻina o ka hiki ʻana i ka substrate, i hiki ke hoʻopuehu ʻia nā ion mea uhi a puni ka substrate. Eia kekahi, ua waiho ʻia nā ʻāpana ionized coating ma ka ʻili o ka substrate ma lalo o ka hana o ke kahua uila, no laila ua waiho ʻia ka substrate holoʻokoʻa me kahi kiʻi ʻoniʻoni, akā ʻaʻole hiki ke hoʻokō i kēia hopena.
(3) ʻO ke kiʻekiʻe kiʻekiʻe o ka uhi ʻana ma muli o ka sputtering o condensates i hoʻokumu ʻia e ka pahū mau ʻana o ka kiʻiʻoniʻoni i waiho ʻia me nā ion maikaʻi, e hoʻomaikaʻi ana i ka paʻa o ka papa uhi.
(4) Hiki ke hoʻopili ʻia kahi koho ākea o nā mea hoʻonaninani a me nā substrate ma luna o nā mea metala a i ʻole nā ​​​​mea hao.
(5) Hoʻohālikelike ʻia me ka hoʻoheheʻe ʻana o ka mahu (CVD), he haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa, ma lalo o 500 ° C, akā hoʻohālikelike ʻia kona ikaika adhesion me nā kiʻiʻoniʻoni hoʻoheheʻe kemika.
(6) Kiʻekiʻe deposition rate, kiʻiʻoniʻoni wikiwiki, a hiki ke uhi i ka mānoanoa o nā kiʻiʻoniʻoni mai nā ʻumi nanometers a i microns.

ʻO nā hemahema o ka ion coating: ʻaʻole hiki ke mālama pono ʻia ka mānoanoa o ke kiʻi; kiʻekiʻe ka ʻike ʻana o nā hemahema ke koi ʻia ka uhi maikaʻi; a komo nā kinoea i ka ʻili i ka wā o ka uhi ʻana, e hoʻololi i nā waiwai o ka ʻili. I kekahi mau hihia, hoʻokumu ʻia nā lua a me nā nuclei (emi ma mua o 1 nm).

No ka helu deposition, hoʻohālikelike ʻia ka uhi ion me ke ʻano evaporation. No ka maikaʻi o ke kiʻiʻoniʻoni, kokoke a ʻoi aku ka maikaʻi o nā kiʻiʻoniʻoni i hana ʻia e ka ion coating ma mua o nā mea i hoʻomākaukau ʻia e ka sputtering.