Direct ion beam deposition is a type of ion beam assisted deposition. The direct ion beam deposition is a non-mass-separated ion beam deposition. This technique was first used to produce diamond-like carbon films in 1971, based on the principle that the main part of the cathode and anode of the ion source is made of carbon.
The sensible gas is led into the discharge chamber, and an external magnetic field is added to cause a plasma discharge under low pressure conditions, relying on the sputtering effect of the ions on the electrodes to produce carbon ions. Carbon ions and dense ions in the plasma were induced into the deposition chamber at the same time, and they were accelerated to be injected onto the substrate due to the negative bias pressure on the substrate.
The test results show that the carbon ions with the energy of 50~100eV at room temperature, in Si, NaCI, KCI, Ni and other substrates on the preparation of transparent diamond-like carbon film, resistivity as high as 10Q-cm, refractive index of about 2, insoluble in inorganic and organic acids, have a very high hardness.
——This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Aug-31-2023