Kuisa ion beam deposition zvakananga rudzi rwekuisa ion beam assisted deposition. Kuisa ion beam deposition zvakananga ibasa reion risina kuparadzaniswa zvakanyanya. Iyi nzira yakatanga kushandiswa kugadzira mafirimu ekabhoni akafanana nedhaimani muna 1971, zvichibva papfungwa yekuti chikamu chikuru che cathode ne anode ye ion source inogadzirwa nekabhoni.
Gasi rinonzwisisika rinopinzwa mukamuri rekubuditsa, uye simba remagineti rekunze rinowedzerwa kuti ribudise plasma pasi pemamiriro ekumanikidzwa kwakaderera, zvichienderana nemhedzisiro yemaion pamaelectrodes kuti agadzire maion ecarbon. Maion ecarbon nemaion akakora muplasma zvakapinzwa mukamuri rekuisira panguva imwe chete, uye zvakakurumidziswa kuti zvipinzwe musubstrate nekuda kwekumanikidzwa kwe negative bias pasubstrate.
Mhedzisiro yebvunzo inoratidza kuti ma carbon ions ane simba re50~100eV paimbatembiricha, muSi, NaCI, KCI, Ni nedzimwe substrates pakugadzirwa kwefirimu rekabhoni rakaita sedhaimani, resistivity yakakwira kusvika 10Q-cm, refractive index yeinenge 2, isinganyungudike mu inorganic uye organic acids, ine kuomarara kwakanyanya.
——Chinyorwa ichi chakaburitswa namugadziri wemuchina wevacuum coatingGuangdong Zhenhua
Nguva yekutumira: Nyamavhuvhu-31-2023