I-Sputtering Vacuum Coater

I-vacuum coater etshizayo sisixhobo esisetyenziselwa ukufaka iifilim ezibhityileyo zemathiriyeli kwi-substrate. Le nkqubo isetyenziswa ngokuqhelekileyo kwimveliso ye-semiconductors, iiseli zelanga, kunye neentlobo ezahlukeneyo zokugquma kwi-optical kunye ne-electronic applications. Nantsi isishwankathelo esisisiseko sendlela esebenza ngayo:

I-1.I-Vacuum Chamber: Inkqubo yenzeke ngaphakathi kwegumbi le-vacuum ukunciphisa ukungcola kunye nokuvumela ukulawula okungcono kwinkqubo yokubeka.

2. Izinto ekujoliswe kuzo: Izinto eziza kufakwa ziyaziwa njengethagethi. Oku kufakwa ngaphakathi kwigumbi lokufunxa.

3.I-Substrate: I-substrate yimpahla apho ifilimu encinci iya kufakwa khona. Ikwafakwe ngaphakathi kwigumbi lokufunxa.

I-4.I-Plasma Generation: Igesi ye-inert, ngokuqhelekileyo i-argon, ifakwe kwigumbi. I-voltage ephezulu isetyenziswe kwithagethi, idala iplasma (imeko yento equkethe i-electrons kunye ne-ion zamahhala).

I-5.I-Sputtering: I-Ions esuka kwi-plasma ingqubana kunye nezinto ezijoliswe kuzo, i-athomu enkqonkqozayo okanye iimolekyuli zisuka kwindawo ekujoliswe kuyo. Ezi ngqungquthela zihamba nge-vacuum kwaye zifake kwi-substrate, zenze ifilimu encinci.

I-6.Ukulawula: Ubuninzi kunye nokubunjwa kwefilimu kunokulawulwa ngokuchanekileyo ngokuhlengahlengisa iiparitha ezifana namandla asetyenziswe kwithagethi, uxinzelelo lwegesi ye-inert, kunye nobude benkqubo yokutshiza.

–Eli nqaku likhutshwa nguumenzi womatshini wokugqumaGuangdong Zhenhua