ʻO ke kuhikuhi o ka hoʻomohala ʻana i ka ʻenehana cell silicon crystalline e komo pū ana me ka ʻenehana PERT a me ka ʻenehana Topcon, ua manaʻo ʻia kēia mau ʻenehana ʻelua he hoʻonui o ke ʻano hana diffusion kuʻuna o ka ʻenehana cell, ʻo kā lākou mau ʻano maʻamau ka papa passivation ma ka ʻaoʻao hope o ke kelepona, a hoʻohana nā mea ʻelua i kahi papa o ka silicon poly doped ma ke ʻano he kahua hope, hoʻohana nui ʻia ke kula ma ka papa oxidized wela kiʻekiʻe, a hoʻohana ʻia ka papa silicon poly doped ma ke ʻano o LPCVD a me PECVD, a pēlā aku. Ua hoʻohana ʻia ka Tubular PECVD a me Tubular PECVD a me ka papa pālahalaha PECVD i ka hana nui ʻana o nā cell PERC.
Loaʻa i ka tubular PECVD kahi mana nui a hoʻohana pinepine i kahi lako mana haʻahaʻa-alapine o kekahi mau ʻumi o kHz. Hiki i nā pilikia o ka Ion bombardment a me ka bypass plating ke hoʻopilikia i ka maikaʻi o ka papa passivation. ʻAʻohe pilikia o ka papa pālahalaha PECVD i ka bypass plating, a he pono nui aʻe i ka hana uhi ʻana, a hiki ke hoʻohana ʻia no ka waiho ʻana o nā kiʻiʻoniʻoni Si, Si0X, SiCX i doped ʻia. ʻO ka hemahema, ʻo ka nui o ka hydrogen i loko o ka kiʻiʻoniʻoni i hoʻopili ʻia, maʻalahi ke hana i ka blistering o ka papa kiʻiʻoniʻoni, kaupalena ʻia i ka mānoanoa o ka uhi ʻana. ʻO ka ʻenehana uhi lpcvd e hoʻohana ana i ka uhi umu paipu, me kahi mana nui, hiki ke waiho i ka kiʻiʻoniʻoni polysilicon mānoanoa, akā e loaʻa kahi plating a puni, ma ke kaʻina hana lpcvd ma hope o ka wehe ʻana o ka papa kiʻiʻoniʻoni a puni a ʻaʻole hōʻeha i ka papa lalo. Ua hoʻokō nā cell Topcon i hana nui ʻia i ka awelika hoʻololi pono o 23%.
——Ua hoʻokuʻu ʻia kēia ʻatikala emīkini uhi hakahakaGuangdong Zhenhua
Ka manawa hoʻouna: Sep-22-2023

