The shugabanci na crystalline silicon cell fasahar ci gaba kuma hada PERT fasaha da kuma Topcon fasaha, wadannan biyu fasahar da ake daukarsa a matsayin tsawo na gargajiya watsawa hanya cell fasahar, su na kowa halaye ne passivation Layer a baya gefen tantanin halitta, da kuma duka biyu amfani da Layer na doped poly silicon a matsayin baya filin, da makaranta ne mafi yawa amfani a high-zazzabi oxidized Layer, da kuma doped da polyethylene Layer na PPC da dai sauransu. An yi amfani da PECVD da Tubular PECVD da farantin lebur PECVD a cikin babban adadin yawan ƙwayoyin PERC.
Tubular PECVD yana da babban ƙarfin aiki kuma gabaɗaya yana ɗaukar ƙarancin wutar lantarki na dubun kHz da yawa. ion bombardment da kewaye plating matsaloli iya shafar ingancin passivation Layer. Flat farantin PECVD ba shi da matsalar kewaye plating, kuma yana da mafi girma amfani a shafi yi aiki, da kuma za a iya amfani da jijiya na doped Si, Si0X, SiCX fina-finai. Rashin hasara shi ne cewa fim ɗin da aka yi da shi ya ƙunshi yawancin hydrogen, mai sauƙi don haifar da blistering Layer na fim, iyakance a cikin kauri na rufi. lpcvd shafi fasaha ta amfani da bututu tanderu shafi, tare da babban iya aiki, na iya ajiye thicker polysilicon fim, amma za a yi a kusa da plating faruwa, a cikin lpcvd tsari bayan cire a kusa da plating na fim Layer kuma ba ya cutar da kasa Layer. Kwayoyin Topcon da aka samar da taro sun sami matsakaicin ƙarfin juzu'i na 23%.
——An fitar da wannan labarininjin rufe fuskaGuangdong Zhenhua
Lokacin aikawa: Satumba-22-2023