I-ion beam deposition luhlobo lwe-ion beam encediswayo. I-ion beam ye-ion ethe ngqo yi-ion beam engahlulwe ngobuninzi. Olu buchule lwaqala ukusetyenziswa ukuvelisa iifilimu ze-diamond-ezifana ne-carbon kwi-1971, ngokusekelwe kumgaqo wokuba inxalenye ephambili ye-cathode kunye ne-anode yomthombo we-ion yenziwe ngekhabhoni.
Irhasi enengqiqo iholwa kwigumbi lokukhupha, kwaye intsimi yangaphandle yamagnetic yongezwa ukuze ibangele ukukhutshwa kweplasma phantsi kweemeko eziphantsi koxinzelelo, kuxhomekeke kwimpembelelo ye-sputtering ye-ion kwi-electrodes ukuvelisa i-carbon ions. I-Carbon ion kunye ne-ion ezixineneyo kwiplasma ziye zangeniswa kwigumbi lokubeka ngexesha elifanayo, kwaye zaye zakhawuleziswa ukuba zifakwe kwi-substrate ngenxa yoxinzelelo olubi olubi kwi-substrate.
Iziphumo zovavanyo zibonisa ukuba i-carbon ions ngamandla e-50 ~ 100eV kwiigumbiiqondo lobushushu, e Si, NaCI, KCI, Ni kunye nezinye substrates ekulungiseleleni elubala diamond-ezifana carbon film, resistivity phezulu 10Q-cm, index refractive malunga 2, ezinganyibilikiyo inorganic kunye ne-asidi eziphilayo, ukuba ubulukhuni eliphezulu kakhulu.
——Eli nqaku likhutshwe nguumenzi womatshini wokugqumaGuangdong Zhenhua
Ixesha lokuposa: Aug-31-2023