ʻO ka Plasma Enhanced Chemical Vapor Deposition Mokuna 2

Hiki ke hoʻohuehu ʻia ka hapa nui o nā mea kemika ma ka hoʻohui ʻana iā lākou me nā pūʻulu kemika, e laʻa me ka pane ʻana o Si me H a lilo i SiH4, a hui pū ʻo Al me CH3 e lilo i Al(CH3). Ma ke kaʻina hana CVD wela, hoʻopili nā kinoea i luna i kekahi nui o ka ikehu wela i ko lākou hele ʻana i loko o ka substrate wela a hana i nā pūʻulu reactive, e like me CH3 a me AL (CH3)2, a me nā mea ʻē aʻe. A laila, hui pū kekahi me kekahi a waiho ʻia e like me nā kiʻiʻoniʻoni lahilahi. I ka hihia o PECVD, ʻo ka hui ʻana o nā electrons, nā ʻāpana energetic a me nā molekole gas-phase i loko o ka plasma hāʻawi i ka ikehu hoʻāla e pono ai e hana i kēia mau pūʻulu kemika reactive.

ʻO nā mea maikaʻi o PECVD ka mea nui ma nā ʻano aʻe:

(1) Haʻahaʻa kaʻina hana i hoʻohālikelike ʻia me ka hoʻoheheʻe ʻana i ka mahu kemika maʻamau, ʻo ia ka mea nui ma muli o ka hoʻoulu ʻana o ka plasma o nā ʻāpana reactive ma mua o ka hoʻoulu ʻana i ka hoʻomehana maʻamau;

(2) E like me ka CVD maʻamau, ka hoʻopili maikaʻi ʻana a puni ka papa kiʻiʻoniʻoni;

(3) Hiki ke ho'omalu 'ia ka ho'okumu 'ana o ka papa ki'i'oni'oni i ka nui, e ma'alahi ka loa'a 'ana o nā ki'i multilayer;

(4) Hiki ke hoʻomalu ʻia ke koʻikoʻi kiʻiʻoniʻoni e ka ʻenehana huila kiʻekiʻe/haʻahaʻa.

-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua