Tekinoroji yekuisa ion beam assisted deposition inyanzvi yekuisa ion beam uye vapor deposition coating inosanganiswa netekinoroji yekugadzirisa ion pamusoro pe composite ion. Mukugadzirisa pamusoro pezvinhu zvakaiswa ion, zvingave zvinhu zve semiconductor kana zveinjiniya, Zvinodiwa kuti ukobvu hwe layer yakagadziridzwa huve hwakakura kupfuura hwekuisa ion, asi zvakare kuda kuchengetedza zvakanakira zve ion injection process, senge layer yakagadziridzwa uye substrate iri pakati pe sharp interface, inogona kugadziriswa pa workpiece ye room temperature, nezvimwewo. Saka, nekubatanidza ion implantation ne coating technology, ma ions ane simba rakati anoramba achiiswa mu interface iri pakati pefirimu ne substrate uku achiisa jira, uye maatomu e interfacial anosanganiswa nerubatsiro rwe cascade collisions, zvichigadzira atomu mixing transition zone pedyo ne interface yekutanga kuti ivandudze bonding force pakati pefirimu ne substrate. Zvadaro, panzvimbo yekusanganisa atomu, firimu rine ukobvu hunodiwa uye hunhu hunoramba huchikura nekubatanidzwa kweion beam.
Izvi zvinonzi Ion Beam Assisted Deposition (IBED), iyo inoramba iine hunhu hwemaitiro ekuisa maion uku ichibvumira substrate kuti ifukidzwe nefirimu rakatetepa rakasiyana zvachose nesubstrate.
Kuisa ion beam assisted deposition kune zvakanakira zvinotevera.
(1) Sezvo ion beam assisted deposition ichigadzira plasma isina gasi rinobuda, kufukidza kunogona kuitwa nekumanikidzwa kwe <10-2 Pa, zvichideredza kusvibiswa kwegasi.
(2) Ma parameter ekutanga ekushanda (simba reion, huwandu hweion) ane magetsi. Kazhinji hazvidi kudzora kuyerera kwegasi nezvimwe zvinhu zvisiri zvemagetsi, unogona kudzora kukura kwefirimu, kugadzirisa maumbirwo uye chimiro chefirimu, zviri nyore kuve nechokwadi chekuti maitiro acho anodzokororwa.
(3) Pamusoro pechinhu chebasa chinogona kuputirwa nefirimu yakasiyana zvachose nesubstrate uye ukobvu hwacho hahugumiriswi nesimba remaion ebhombardment patembiricha yakaderera (<200℃). Yakakodzera kurapwa pamusoro pemafirimu anoshanda, maforoma emuchina anotonhora uye simbi yekuvaka inodziya tembiricha yakaderera.
(4) Inzira isina kuenzana inodzorwa patembiricha yemumba. Mafirimu matsva anoshanda akadai sezvikamu zvekupisa kwakanyanya, zvikamu zvinogadzikana, alloys dzisina chimiro, nezvimwewo zvinogona kuwanikwa patembiricha yemumba.
Zvikanganiso zve ion beam assisted deposition ndeizvi.
(1) Nekuti danda reion rine hunhu hwemwaranzi yakananga, zvakaoma kubata nechimiro chakaoma chechinhu chebasa.
(2) Zvakaoma kubata nemidziyo mikuru nenzvimbo hombe nekuda kwekuganhurirwa kwehukuru hwemvura ye ion beam.
(3) Chiyero chekuisa maion beam assisted deposition chinowanzoita 1nm/s, iyo yakakodzera kugadzirira matete efirimu, uye haina kukodzera kuputira zvigadzirwa zvakawanda.
–Chinyorwa ichi chakaburitswa namugadziri wemuchina wevacuum coatingGuangdong Zhenhua
Nguva yekutumira: Mbudzi-16-2023