Ion beam inobatsira deposition tekinoroji ndiyo ion beam jekiseni uye vapor deposition coating tekinoroji yakasanganiswa neion surface composite yekugadzirisa tekinoroji. Mukuita kugadziridzwa kwepasi kweiyoni jekiseni zvinhu, ingave semiconductor zvinhu kana zveinjiniya, Zvinowanzo kushuvira kuti ukobvu hweiyo yakagadziridzwa dhizaini yakakura kupfuura iyo yekuisirwa ion, asi zvakare inoda kuchengetedza mabhenefiti eiyo ion jekiseni maitiro, seyakagadziridzwa layer uye substrate pakati peinopinza interface, inogona kugadziriswa pakamuri tembiricha workpiece, zvichingodaro. Naizvozvo, nekubatanidza ion implantation necoating tekinoroji, maion ane rimwe simba anoramba achiiswa muinterface pakati pefirimu nesubstrate paanenge achipfekedzwa, uye maatomu akatarisana anosanganiswa nerubatsiro rwekudhumhana kweatomu, kuumba atomu inosanganisa shanduko yenzvimbo padyo nenzvimbo yekutanga kuvandudza simba rekubatanidza pakati pefirimu neiyo substrate. Zvino, pane atomu yekusanganisa zone, iyo firimu ine ukobvu hunodiwa uye zvivakwa zvinoramba zvichikura nekutora chikamu kweion danda.
Izvi zvinodaidzwa kuti Ion Beam Assisted Deposition (IBED), iyo inochengeta hunhu hweiyo ion implantation process ichibvumira iyo substrate kuti ifukidzwe neyakaonda firimu zvinhu zvakasiyana zvachose kubva kune substrate.
Ion beam yakabatsirwa deposition ine zvinotevera zvakanakira.
(1) Sezvo ion danda rinobatsira deposition inogadzira plasma isina kubuda gasi, kupfekedza kunogona kuitwa pakumanikidzwa kwe <10-2 Pa, kuderedza kusvibiswa kwegasi.
(2) Iwo ekutanga maitiro paramita (ion simba, ion density) ndeyemagetsi. Kazhinji hazvidi kudzora kuyerera kwegasi uye mamwe maparameter asiri emagetsi, unogona kudzora nyore kukura kweiyo firimu layer, gadzirisa kuumbwa uye chimiro chefirimu, zviri nyore kuve nechokwadi chekudzokorora kwemaitiro.
(3) Nzvimbo yebasa rekushanda inogona kuputirwa nefirimu yakasiyana zvachose kubva kune substrate uye hupamhi hahuna kuderedzwa nesimba rebhombardment ions pakupisa kwakadzika (<200 ℃). Inokodzera kurapwa kwepamusoro kwemafirimu anoshanda ane doped, anotonhora machini akakwenenzverwa molds uye yakaderera tembiricha tempered simbi yekugadzira.
(4) Iyo isiri-yakaenzana maitiro inodzorwa pakupisa kwekamuri. Mafirimu matsva anoshanda akadai seyepamusoro-tembiricha zvikamu, substable phases, amorphous alloys, nezvimwe zvinogona kuwanikwa pakamuri tembiricha.
Izvo zvakashata zveiyo ion beam yakabatsirwa deposition ndeye.
(1) Nekuti iyo ion danda ine yakananga radiation maitiro, zvakaoma kubata neyakaomesesa chimiro cheiyo workpiece
(2) Zvakaoma kubata nehombe-yakakura uye yakakura-nzvimbo workpieces nekuda kwekuganhurirwa kwehukuru hweiyo ion beam rwizi.
(3) Iyo ion danda rinobatsira deposition rate rinowanzo kutenderedza 1nm/s, iyo inokodzera kugadzirwa kweakaonda firimu akaturikidzana, uye haina kukodzera plating yehuwandu hwakawanda hwezvigadzirwa.
-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: Nov-16-2023