With the increasing development of sputtering coating, especially magnetron sputtering coating technology, at present, for any material can be prepared by ion bombardment target film, because the target is sputtered in the process of coating it to some kind of substrate, the quality of the measured film has an important impact, therefore, the requirements for the target material is also more stringent. In the selection of target material, in addition to the use of the film itself should be selected, should also consider the following issues:
The target material should have good mechanical strength and chemical stability after the film;
The target and the substrate must be firmly combined, otherwise it should be taken with the substrate has a good combination of membrane layer, first sputtering a base film and then the preparation of the required membrane layer;
As a reaction sputtering into the membrane material must be easy to react with the gas to generate a compound film.
Under the premise of meeting the performance requirements of the membrane, the difference between the coefficient of thermal expansion of the target material and the substrate is as small as possible, so as to minimize the influence of thermal stress on the sputtered membrane.
According to the use and performance requirements of the membrane, the target material must meet the purity, impurity content, component uniformity, machining accuracy and other technical requirements.
–This article is released by vacuum coating machine manufacturer Guangdong Zhenhua
Post time: Jan-09-2024