Nrog rau kev loj hlob ntawm kev siv tshuab sputtering, tshwj xeeb tshaj yog magnetron sputtering coating technology, tam sim no, rau txhua yam khoom siv tuaj yeem npaj los ntawm ion bombardment target film, vim tias lub hom phiaj yog sputtered thaum lub sijhawm txheej txheem ntawm kev txheej nws rau qee yam substrate, qhov zoo ntawm cov yeeb yaj kiab ntsuas muaj qhov cuam tshuam tseem ceeb, yog li ntawd, cov kev cai rau cov khoom siv hom phiaj kuj tseem nruj dua. Hauv kev xaiv cov khoom siv hom phiaj, ntxiv rau kev siv cov yeeb yaj kiab nws tus kheej yuav tsum tau xaiv, kuj yuav tsum xav txog cov teeb meem hauv qab no:
Cov khoom siv yuav tsum muaj lub zog zoo thiab kev ruaj khov tom qab zaj duab xis;
Lub hom phiaj thiab lub substrate yuav tsum tau sib xyaw ua ke, txwv tsis pub nws yuav tsum tau coj nrog lub substrate muaj kev sib xyaw zoo ntawm cov txheej membrane, thawj zaug sputtering ib zaj duab xis puag thiab tom qab ntawd kev npaj ntawm cov txheej membrane uas xav tau;
Raws li ib qho tshuaj tiv thaiv sputtering rau hauv cov ntaub ntawv membrane yuav tsum yooj yim rau react nrog cov roj los tsim ib zaj duab xis compound.
Raws li lub hauv paus ntawm kev ua tau raws li qhov yuav tsum tau ua ntawm daim nyias nyias, qhov sib txawv ntawm cov coefficient ntawm thermal expansion ntawm cov khoom siv thiab cov substrate yog me me li sai tau, yog li ntawd kom txo qhov cuam tshuam ntawm thermal kev ntxhov siab rau ntawm daim nyias nyias sputtered.
Raws li kev siv thiab kev ua tau zoo ntawm daim nyias nyias, cov khoom siv yuav tsum ua tau raws li qhov huv, cov ntsiab lus tsis huv, kev sib xws ntawm cov khoom, kev ua haujlwm raug thiab lwm yam kev cai.
– Tsab xov xwm no yog tso tawm los ntawmlub tshuab nqus tsev txheej tshuab chaw tsim khoomGuangdong Zhenhua
Lub sijhawm tshaj tawm: Lub Ib Hlis-09-2024