Ion beam nyere aka na teknụzụ nkwụnye ego

Nkà na ụzụ nkwụnye ego ion beam na-enyere aka bụ ntụtụ ion beam na teknụzụ mkpuchi mkpuchi vapor jikọtara ya na teknụzụ nhazi ihe mejupụtara ion elu. Na usoro nke elu mgbanwe nke ion injected ihe, ma semiconductor ihe ma ọ bụ engineering ihe, Ọ na-achọkarị na ọkpụrụkpụ nke gbanwetụrụ oyi akwa dị ukwuu karịa nke ion implantation, ma na-chọrọ iji na-ejigide uru nke ion injection usoro, dị ka gbanwetụrụ oyi akwa na mkpụrụ n'etiti nkọ interface, nwere ike esichara na ụlọ okpomọkụ workpiece, na na. Ya mere, site na ijikọta ion implantation na mkpuchi technology, ion na ụfọdụ ume na-anọgide na-injected n'ime interface n'etiti film na mkpụrụ mgbe mkpuchi, na interfacial atọm na-agwakọta na enyemaka nke cascade collisions, na-akpụ a atọm Ịgwakọta mgbanwe mpaghara nso mbụ interface iji melite bonding ike n'etiti ihe nkiri na mkpụrụ. Mgbe ahụ, na mpaghara ngwakọta atom, ihe nkiri ahụ nwere ọkpụrụkpụ achọrọ na ihe onwunwe na-aga n'ihu na-eto eto na ntinye nke ion beam.

A na-akpọ nke a Ion Beam Assisted Deposition (IBED), nke na-ejigide njirimara nke usoro ntinye ion ka ọ na-enye ohere ka ejiri ihe nkiri dị mkpa kpuchie ya nke dị nnọọ iche na mkpụrụ.

Nkwanye nkwado ion beam nwere uru ndị a.

(1) Ebe ọ bụ na ntinye aka nke ion na-emepụta plasma na-enweghị nkwụsị gas, enwere ike ịme mkpuchi na nrụgide nke <10-2 Pa, na-ebelata mmetọ gas.

(2) The isi usoro parameters (ion ike, ion njupụta) bụ eletriki. N'ozuzu, ọ dịghị mkpa ịchịkwa gas eruba na ndị ọzọ na-abụghị eletriki parameters, ị nwere ike mfe ịchịkwa uto nke ihe nkiri oyi akwa, mezie mejupụtara na Ọdịdị nke ihe nkiri, mfe iji hụ na repeatability nke usoro.

(3) N'elu nke workpiece nwere ike ntekwasa na a film bụ kpamkpam dị iche iche na mkpụrụ na ọkpụrụkpụ na-ejedebeghị site ike nke bombu ion na ala okpomọkụ (<200 ℃). Ọ dabara maka ọgwụgwọ elu nke ihe nkiri na-arụ ọrụ doped, ihe eji arụ ọrụ nke ọma na oyi na-atụ na nchara nchara dị ala.

(4) Ọ bụ usoro enweghị nha nha na-achịkwa na okpomọkụ nke ụlọ. Enwere ike nweta ihe nkiri ọhụrụ na-arụ ọrụ dị ka usoro okpomọkụ dị elu, akụkụ dị ike, alloys amorphous, wdg. na ụlọ okpomọkụ.

Ọdịmma nke ion beam enyemaka ntinye bụ.

(1) N'ihi na ion beam nwere kpọmkwem radieshon àgwà, o siri ike obibi mgbagwoju elu udi nke workpiece

(2) Ọ na-esiri ike ime ihe na-arụ ọrụ nke ukwuu na nnukwu ebe n'ihi njedebe nke oke iyi iyi ion.

(3) Ọnụ ego nkwụnye ego na-enyere aka na ion beam na-abụkarị ihe dịka 1nm / s, nke kwesịrị ekwesị maka nkwadebe nke ihe nkiri ihe nkiri dị mkpa, ọ dịghịkwa mma maka ịkwanye nnukwu ngwaahịa.

–E wepụtara akụkọ aonye na-emepụta igwe mkpuchi ikukuGuangdong Zhenhua