Ukubekwa Kwekhemikhali Okuthuthukisiwe Kwe-Plasma Isahluko 1

I-Chemical Vapor Deposition (CVD). Njengoba igama lisho, kuyindlela esebenzisa i-gaseous precursor reactants ukukhiqiza amafilimu aqinile ngokusebenzisa ukusabela kwamakhemikhali e-athomu kanye ne-intermolecular. Ngokungafani ne-PVD, inqubo ye-CVD ngokuvamile yenziwa endaweni yokucindezela okuphezulu (i-vacuum ephansi), lapho kusetshenziswa ingcindezi ephakeme ngokuyinhloko ukukhulisa izinga lokubeka ifilimu. Ukufakwa komhwamuko wamakhemikhali kungahlukaniswa ngokwejwayelekile i-CVD (eyaziwa nangokuthi i-thermal CVD) kanye ne-plasma-enhanced chemical vapor deposition (I-Plasma-Enhanced Chemical Vapor Deposition. PECVD) ngokuya ngokuthi i-plasma iyabandakanyeka yini kunqubo yokubeka. Lesi sigaba sigxile kubuchwepheshe be-PECVD okuhlanganisa inqubo ye-PECVD kanye nemishini evame ukusetshenziswa ye-PECVD kanye nesimiso sokusebenza.

Ukufakwa komhwamuko wamakhemikhali e-Plasma kuyindlela yokubeka umhwamuko wamakhemikhali efilimu encane esebenzisa i-plasma yokukhipha ukukhanya ukuze ibe nomthelela enqubweni yokubeka ngenkathi inqubo yokubeka umhwamuko wamakhemikhali enomfutho ophansi kwenzeka. Ngalo mqondo, ubuchwepheshe obujwayelekile be-CVD buncike emazingeni okushisa aphezulu e-substrate ukuze kubonakale ukusabela kwamakhemikhali phakathi kwezinto zesigaba segesi kanye nokufakwa kwamafilimu amancane, futhi ngaleyo ndlela bungabizwa ngokuthi ubuchwepheshe be-CVD obushisayo.

Kudivayisi ye-PECVD, ukucindezela kwegesi okusebenzayo kumayelana ne-5 ~ 500 Pa, futhi ukuminyana kwama-electron nama-ion kungafinyelela ku-109 ~ 1012 / cm3, kuyilapho isilinganiso samandla ama-electron singafinyelela ku-1 ~ 10 eV. Okuhlukanisa indlela ye-PECVD kwezinye izindlela ze-CVD ukuthi i-plasma iqukethe inani elikhulu lama-electron anamandla amakhulu, anganikeza amandla okusebenza adingekayo ngenqubo yokubeka umhwamuko wamakhemikhali. Ukungqubuzana kwama-electron nama-molecule e-gas-phase kungakhuthaza ukubola, i-chemosynthesis, i-excitation kanye nezinqubo ze-ionization zamangqamuzana egesi, okukhiqiza amaqembu amakhemikhali asebenzayo kakhulu, ngaleyo ndlela kunciphise kakhulu izinga lokushisa le-CVD yokubeka ifilimu encane, okwenza kube nokwenzeka ukuqaphela inqubo ye-CVD, okudingeka ekuqaleni ukuthi yenziwe emazingeni okushisa aphansi, ekushiseni okuphansi. Ubuhle bokushisa okuphansi kwefilimu encane yokubekwa kwefilimu ukuthi ingagwema ukusakazeka okungadingekile nokusabela kwamakhemikhali phakathi kwefilimu ne-substrate, izinguquko zesakhiwo kanye nokuwohloka kwefilimu noma impahla engaphansi, kanye nokucindezeleka okukhulu kokushisa kufilimu kanye ne-substrate.

-Le ndatshana ikhishwe nguumenzi womshini we-vacuum coatingI-Guangdong Zhenhua