Kubviswa kweMvura yeChemical (CVD). Sezvinoreva zita racho, inzira inoshandisa magasi anogadzira magasi kugadzira mafirimu akasimba kuburikidza neatomu uye intermolecular chemical reactions. Kusiyana nePVD, maitiro eCVD anowanzoitwa munzvimbo ine kumanikidzwa kwakanyanya (vacuum yakaderera), nekumanikidzwa kwakanyanya kunoshandiswa zvakanyanya kuwedzera mwero wekuiswa kwefirimu. Kuiswa kwemvura yeChemical kunogona kuiswa muzvikamu zveCVD (inozivikanwawo sethermal CVD) uye plasma-enhanced chemical vapor deposition (Plasma-Enhanced Chemical Vapor Deposition. PECVD) zvichienderana nekuti plasma inobatanidzwa here mukushandiswa kwemvura. Chikamu chino chinotarisa patekinoroji yePECVD kusanganisira maitiro ePECVD nemidziyo yePECVD inoshandiswa zvakanyanya uye musimboti wekushanda.
Kuisa plasma mupombi wemakemikari unowedzerwa inzira yekuisa plasma mupombi wemakemikari wakatetepa inoshandisa plasma inoburitsa chiedza kuti iite simba pakuisa plasma ukuwo makemikari anobuda mupombi wemakemikari ane simba shoma ari kuitika. Mupfungwa iyi, tekinoroji yeCVD yakajairika inoshandisa tembiricha yepamusoro kuti iite kuti makemikari ashande pakati pezvinhu zvegasi uye kuisa firimu rakatetepa, uye nokudaro inogona kunzi tekinoroji yeCVD inodziya.
Muchishandiso chePECVD, kumanikidzwa kwegasi rinoshanda kuri pa5~500 Pa, uye huwandu hwemaerekitironi nemaion hunogona kusvika pa109~1012/cm3, nepo simba remaerekitironi richigona kusvika pa1~10 eV. Chinosiyanisa nzira yePECVD nedzimwe nzira dzeCVD ndechekuti plasma ine huwandu hwakawanda hwemaerekitironi ane simba guru, ayo anogona kupa simba rekuita kuti makemikari ashande. Kusangana kwemaerekitironi nemamorekuru egasi kunogona kukurudzira kuora, chemosynthesis, excitation uye ionization processes yemamorekuru egasi, zvichigadzira mapoka emakemikari anobata zvakanyanya, nokudaro zvichideredza zvakanyanya tembiricha yeCVD thin film deposition, zvichiita kuti zvikwanisike kuita CVD process, iyo pakutanga inodiwa kuti iitwe patembiricha yakakwira, patembiricha yakaderera. Kubatsira kwekudzikisa thin film deposition patembiricha yakaderera ndekwekuti inogona kudzivirira kupararira kusingakoshi uye makemikari pakati pefirimu ne substrate, shanduko dzechimiro uye kuora kwefirimu kana substrate material, uye kushushikana kukuru kwekupisa mufirimu ne substrate.
–Chinyorwa ichi chakaburitswa namugadziri wemuchina wevacuum coatingGuangdong Zhenhua
Nguva yekutumira: Kubvumbi-18-2024