Kunezindlela ezimbili eziyinhloko ze-ion beam-assisted deposition, eyodwa i-hybrid dynamic; enye i-static hybrid. Owokuqala ubhekisela efilimini ekukhuleni uhlale ehambisana namandla athile kanye ne-beam current ye-ion bombardment nefilimu; eyokugcina ifakwe ngaphambili ebusweni be-substrate ungqimba olungaphansi kwama-nanometers ambalwa ukujiya kongqimba lwefilimu, bese kuba i-ion bombardment enamandla, futhi ingaphindaphindwa izikhathi eziningi kanye nokukhula kongqimba lwefilimu.
Amandla e-ion beam akhethelwe ukufakwa kwe-ion beam amafilimu amancane asebangeni elingu-30 eV kuya ku-100 keV. Ibanga lamandla elikhethiwe lincike ohlotsheni lwesicelo ifilimu esenzelwa sona. Isibonelo, ukulungiswa kokuvikela ukugqwala, ukugqokwa kwe-anti-mechanical, i-coatings yokuhlobisa namanye amafilimu amancane kufanele kukhethwe amandla aphezulu e-bombardment. Ukuhlola kubonisa ukuthi, njengokukhethwa kwamandla angu-20 kuya ku-40keV we-ion beam bombardment, i-substrate material kanye nefilimu ngokwayo ngeke kuthinte ukusebenza nokusetshenziswa komonakalo. Ekulungiseleleni amafilimu amancane amadivaysi optical kanye ne-elekthronikhi, ukufakwa okusizwa kwe-ion beam yamandla aphansi kufanele kukhethwe, okungagcini nje ukunciphisa ukukhanya kokukhanya futhi kugweme ukwakheka kweziphambeko ezicushwe ngogesi, kodwa futhi kusiza ukwakheka kwesakhiwo sesimo esizinzile se-membrane. Ucwaningo luye lwabonisa ukuthi amafilimu anezakhiwo ezinhle kakhulu angatholakala ngokukhetha amandla e-ion angaphansi kuka-500 eV.
-Le ndatshana ikhishwe nguumenzi womshini we-vacuum coatingI-Guangdong Zhenhua
Isikhathi sokuthumela: Mar-11-2024