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Umphumela wokuqhuma kwe-ion ku-interface yesendlalelo sefilimu/i-substrate

Umthombo wesihloko: I-vacuum ye-Zhenhua
Funda: 10
Kushicilelwe: 23-12-09

Lapho kuqala ukufakwa kwama-athomu e-membrane, ukuqhuma kwama-ion kunemiphumela elandelayo ku-interface ye-membrane/substrate.

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(1) Ukuxubana ngokomzimba. Ngenxa yokufakwa kwama-ion anamandla aphezulu, ukugeleza kwama-athomu abekwe kanye nokufakwa kwama-athomu angaphezulu kanye nesenzakalo sokushayisana kwe-cascade, kuzobangela indawo eseduze kobuso be-membrane/base interface yezinto ze-substrate kanye nezinto ze-membrane zokuxubana okungasabalali, lo mphumela wokuxuba uzoba usizo ekwakhekeni kwe-membrane/base interface "pseudo-diffusion layer", okungukuthi, ungqimba lokuguquka phakathi kwe-membrane/base interface, kuze kube ngubukhulu obungama-microns ambalwa. Ubukhulu obungama-micrometer ambalwa, lapho kungase kuvele khona izigaba ezintsha. Lokhu kuhle kakhulu ukuthuthukisa amandla okunamathela kwe-membrane/base interface.

(2) Ukusabalala okuthuthukisiwe. Ukuhlushwa okuphezulu kwesici endaweni eseduze nobuso kanye nokushisa okuphezulu kwandisa izinga lokusabalala. Njengoba ubuso buyisici sephuzu, ama-ion amancane athambekele ekuphambukeni kobuso, kanti ukuqhunyiswa kwama-ion kunomphumela wokuthuthukisa ukuphambuka kobuso nokuthuthukisa ukusabalala kokubili kwama-athomu agciniwe kanye nama-substrate.

(3) Imodi ye-nucleation ethuthukisiwe. Izakhiwo ze-athomu ehlanganisiwe ebusweni be-substrate zinqunywa ukusebenzisana kwayo kobuso kanye nezakhiwo zayo zokufuduka ebusweni. Uma kungekho ukusebenzisana okuqinile phakathi kwe-athomu ehlanganisiwe kanye nobuso be-substrate, i-athomu izosakazeka ebusweni ize iqhume endaweni enamandla aphezulu noma ishayisane namanye ama-athomu asakazekayo. Le ndlela ye-nucleation ibizwa ngokuthi i-non-reactive nucleation. Ngisho noma eyasekuqaleni ingeyomodi ye-non-reactive nucleation, ngokuqhuma kwe-ion ebusweni be-substrate kungadala amaphutha amaningi, okwandisa ubuningi be-nucleation, okusiza kakhulu ekwakhekeni kwemodi ye-diffusion - reactive nucleation.

(4) Ukususwa okukhethekile kwama-athomu aboshwe ngokukhululekile. Ukuchitheka kwama-athomu angaphezulu kunqunywa isimo sokubopha sendawo, futhi ukuqhunyiswa kwama-ion ebusweni kungenzeka kakhulu ukuthi kukhiphe ama-athomu aboshwe ngokukhululekile. Lo mphumela ubonakala kakhulu ekwakhekeni kwezixhumi ezisebenzayo zokusabalala.

(5) Ukuthuthukiswa kokumbozwa kwendawo kanye nokuthuthukiswa kwe-plating bypass. Ngenxa yokucindezela okuphezulu kwegesi esebenzayo kwe-ion plating, ama-athomu ahwamukile noma achithekile abhekana nokushayisana nama-athomu egesi ukuze kuthuthukiswe ukuhlakazeka, okuholela ezicini ezinhle zokugoqa ungqimba.

–Lesi sihloko sikhishwe yi-umenzi womshini wokumboza nge-vacuumI-Guangdong Zhenhua


Isikhathi sokuthunyelwe: Disemba-09-2023