Kukho iindlela ezimbini eziphambili ze-ion beam-assisted deposition, enye i-dynamic hybrid; enye yi-static hybrid. Owangaphambili ubhekisela kwifilimu kwinkqubo yokukhula ihlala ihamba kunye namandla athile kunye ne-beam current ye-ion bombardment kunye nefilimu; le yokugqibela ifakwe ngaphambili kumphezulu we-substrate umaleko ongaphantsi kwee-nanometers ezimbalwa zobukhulu befilimu, kwaye emva koko ibhomu ye-ion enamandla, kwaye inokuphinda iphindwe ngamaxesha amaninzi kunye nokukhula komgangatho wefilimu.
Amandla e-ion beam akhethwe kwi-ion beam encediswayo ekufakweni kweefilim ezicekethekileyo akuluhlu lwe-30 eV ukuya kwi-100 keV. Uluhlu lwamandla olukhethiweyo luxhomekeke kuhlobo lwesicelo apho ifilimu isenziwa khona. Ngokomzekelo, ukulungiswa kokukhusela i-corrosion, i-anti-mechanical wears, iingubo zokuhlobisa kunye nezinye iifilimu ezincinci kufuneka zikhethwe amandla aphezulu ebhobho. Iimvavanyo zibonisa ukuba, njengokukhethwa kwe-20 ukuya kwi-40keV amandla e-ion beam bombardment, i-substrate material kunye nefilimu ngokwayo ayiyi kuchaphazela ukusebenza kunye nokusetyenziswa komonakalo. Ekulungiseleleni iifilimu ezibhityileyo zezixhobo ze-optical kunye ne-elektroniki, i-ion ephantsi yokuncedisa i-ion beam kufuneka ikhethwe, engagcini nje ukunciphisa ukukhanya kwe-adsorption kwaye igweme ukubunjwa kweziphene ezisebenza ngombane, kodwa iququzelele ukubunjwa kobume be-membrane obuzinzileyo. Uphononongo lubonise ukuba iifilimu ezineempawu ezibalaseleyo zinokufunyanwa ngokukhetha amandla e-ion angaphantsi kwe-500 eV.
–Eli nqaku likhutshwa nguumenzi womatshini wokugqumaGuangdong Zhenhua
Ixesha lokuposa: Mar-11-2024