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ʻO ka hoʻopaʻa ʻana o ka mahu ma ka Plasma Mokuna 1

Kumu ʻatikala:Zhenhua vacuum
Heluhelu:10
Paʻi ʻia: 24-04-18

ʻO ka waiho ʻana o ka mahu (CVD). E like me ka inoa e hōʻike nei, he ʻenehana ia e hoʻohana ai i nā reactants precursor gaseous e hana i nā kiʻiʻoniʻoni paʻa ma o nā hopena kemika atomic a me intermolecular. ʻAʻole like me PVD, hana nui ʻia ke kaʻina CVD ma kahi ʻoi aku ke kiʻekiʻe (lower vacuum), me ka piʻi kiʻekiʻe e hoʻohana mua ʻia e hoʻonui i ka helu deposition o ke kiʻiʻoniʻoni. Hiki ke hoʻokaʻawale ʻia ka waiho ʻana o ka mahu kemika i loko o ka CVD maʻamau (ʻike pū ʻia ʻo thermal CVD) a me ka hoʻoheheʻe ʻana o ka mahu kemika i hoʻonui ʻia i ka plasma (Plasma-Enhanced Chemical Vapor Deposition. PECVD) e like me ke komo ʻana o ka plasma i ke kaʻina hana hoʻomoe. Ke kālele nei kēia ʻāpana i ka ʻenehana PECVD me ke kaʻina hana PECVD a me nā lako PECVD maʻamau a me ke kumu hana.

ʻO ka hoʻoheheʻe ʻana i ka mahu kemika i hoʻonui ʻia i ka plasma he ʻenehana hoʻoheheʻe ʻana i ka mahu kemika kiʻiʻoniʻoni e hoʻohana ana i ka plasma hoʻokuʻu kukui e hoʻoikaika i ke kaʻina hana hoʻoheheʻe ʻoiai ke hana ʻia nei ke kaʻina haʻahaʻa haʻahaʻa. Ma kēia manaʻo, hilinaʻi ka ʻenehana CVD maʻamau i nā mahana substrate kiʻekiʻe e ʻike i ka hopena kemika ma waena o nā mea kinoea a me ka waiho ʻana o nā kiʻiʻoniʻoni lahilahi, a no laila hiki ke kapa ʻia ka ʻenehana CVD thermal.

Ma ka PECVD mea, ka hana kinoea puʻe ma kahi o 5 ~ 500 Pa, a me ka density o nā electrons a me nā ion hiki ke hiki i 109 ~ 1012/cm3, oiai ka awelika ikehu o ka electrons hiki i 1 ~ 10 eV. ʻO ka mea e hoʻokaʻawale ai i ke ʻano PECVD mai nā ʻano CVD ʻē aʻe, ʻo ka plasma ka nui o nā electrons kiʻekiʻe, hiki ke hāʻawi i ka ikehu hoʻāla e pono ai no ke kaʻina deposition chemical vapor. Hiki i ka hui ʻana o nā electrons a me nā molekole kinoea ke hoʻoikaika i ka decomposition, chemosynthesis, excitation a me nā kaʻina hana ionization o nā molekele kinoea, e hana ana i nā pūʻulu kemika reactive, pēlā e hoʻemi nui ai i ka pae wela o ka CVD thin film deposition, e hiki ai ke ʻike i ke kaʻina CVD, ka mea i koi mua ʻia e lawe ʻia i nā mahana wela, i nā haʻahaʻa haʻahaʻa. ʻO ka pōmaikaʻi o ka haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa kiʻiʻoniʻoni deposition ʻo ia ka mea hiki ke pale i ka diffusion pono ʻole a me ka hopena kemika ma waena o ke kiʻiʻoniʻoni a me ka substrate, nā hoʻololi ʻana a me ka hōʻino ʻana o ke kiʻiʻoniʻoni a i ʻole nā ​​mea substrate, a me nā koʻikoʻi wela nui i ke kiʻiʻoniʻoni a me ka substrate.

-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua


Ka manawa hoʻouna: Apr-18-2024