I-Magnetron sputtering ikakhulukazi ihlanganisa ukuthuthwa kwe-plasma ekhishwayo, i-target etching, ukufakwa kwefilimu encane nezinye izinqubo, insimu kazibuthe enqubweni ye-magnetron sputtering izoba nomthelela. Kuhlelo lwe-magnetron sputtering plus orthogonal magnetic field, ama-electron angaphansi kwendima yamandla e-Lorentz futhi enze ukunyakaza kwe-spiral trajectory, kumele abhekane nokungqubuzana okuqhubekayo ukuze aqhubekele kancane kancane ku-anode, ngenxa yokushayisana kwenza ingxenye yama-electron ukuze afinyelele i-anode ngemva kokuba amandla amancane, ukushisa kwamabhomu ku-substrate nakho akukona. Ngaphezu kwalokho, ngenxa ye-electron ngezingqinamba zensimu kazibuthe okuhloswe ngayo, endaweni okuhloswe kuyo umphumela kazibuthe wesifunda ongaphakathi komzila wokulahla lolu hlu oluncane lwasendaweni lokuhlushwa kwama-electron luphakeme kakhulu, futhi kumphumela kazibuthe wesifunda esingaphandle kwendawo engaphansi komhlaba, ikakhulukazi kude nozibuthe eduze nangaphezulu, ukugxiliswa kwe-electron ngenxa yokuhlakazwa kwezimo eziphansi kakhulu futhi ezilinganiselwe zokusabalalisa i-dipobecaputer ezimbili ezisebenzayo, futhi sebenzisa i-diposputer esebenza ngokulingana nezimo ezimbili. umehluko wengcindezi yokuhleleka kobukhulu). Ukuminyana okuphansi kwama-electron aqhuma phezulu kwe-substrate, ukuze ukuqhuma kwe-substrate okubangelwa ukunyuka okuphansi kwezinga lokushisa, okuyindlela eyinhloko ye-magnetron sputtering substrate yokunyuka kwezinga lokushisa liphansi. Ngaphezu kwalokho, uma kukhona insimu kagesi kuphela, ama-electron afinyelela i-anode ngemva kwebanga elifushane kakhulu, futhi amathuba okushayisana negesi esebenzayo angama-63.8% kuphela. Futhi engeza insimu kazibuthe, ama-electron ohlelweni lokuthuthela ku-anode ukwenza ukunyakaza okuvunguzayo, inkambu kazibuthe eboshiwe futhi inwebe i-trajectory yama-electron, ithuthukise kakhulu amathuba okushayisana kwama-electron namagesi asebenzayo, okuthuthukisa kakhulu ukuvela kwe-ionization, i-ionization bese iphinda ikhiqize ama-electron futhi ijoyine inqubo yokushayisana kwe-collision of collision of collision of collision of ukusetshenziswa ngempumelelo kwamandla ama-electron, futhi ngaleyo ndlela ekwakhekeni kwe-high-density Ukuminyana kwe-plasma kuyanda ekuphumeni kokukhanya okungavamile kwe-plasma. Izinga lokufafaza ama-athomu asuka kulokho okuhlosiwe nalo liyakhula, futhi ukuphafaza okuqondiwe okubangelwa ukuqhuma kwethagethi ngama-ion aqondile kusebenza kahle kakhulu, okuyisizathu sezinga eliphezulu le-magnetron sputtering deposition. Ngaphezu kwalokho, ukuba khona kwamandla kazibuthe nakho kungenza isistimu yokufafaza isebenze ngaphansi komfutho womoya ophansi, ingcindezi yomoya ephansi engu-1 ingenza ama-ion endaweni yongqimba lwe-sheath ukunciphisa ukungqubuzana, ukuqhuma kwethagethi ngamandla amakhulu e-kinetic, kanye nosuku lokukwazi ukunciphisa ama-athomu ahlaziywe kanye nokungqubuzana kwegesi okungathathi hlangothi, ukuvimbela i-athomu eqondiswe odongeni ukuya kuma-athomu ahlanekezelwe emuva. ebusweni, ukuthuthukisa izinga kanye nekhwalithi ye-deposition yefilimu encane.
Inkambu kazibuthe eqondiwe ingacindezela ngempumelelo i-trajectory yama-electron, yona futhi ithinte izici ze-plasma kanye nokucushwa kwama-ion kulokho okuhlosiwe.
Ukulandelela: ukwandisa ukufana kwendawo kazibuthe eqondiwe kungakhuphula ukufana kwendawo okugxilwe kuyo, ngaleyo ndlela kuthuthukiswe ukusetshenziswa kwempahla eqondiwe; ukusatshalaliswa kwensimu ye-electromagnetic okunengqondo nakho kungathuthukisa ngempumelelo ukuqina kwenqubo yokufafaza. Ngakho-ke, ekuhlosweni kwe-magnetron sputtering, ubukhulu nokusabalalisa kwendawo kazibuthe kubaluleke kakhulu.
-Le ndatshana ikhishwe nguumenzi womshini we-vacuum coatingI-Guangdong Zhenhua
Isikhathi sokuthumela: Dec-14-2023