Basa reMagnetic Field muMagnetron Sputtering

Magnetron sputtering inonyanya kusanganisira discharge plasma transport, target etching, nhete firimu deposition uye mamwe maitiro, iyo magineti pane magnetron sputtering process ichave nemhedzisiro. Mune magnetron sputtering system plus orthogonal magnetic field, ma electrons ari pasi pebasa reLorentz force uye anoita spiral trajectory movement, anofanirwa kugara achidhumhana kuti zvishoma nezvishoma aende kune anode, nekuda kwekudhumhana kunoita chikamu chemagetsi kuti asvike anode mushure mekunge simba rave diki, kupisa kukuru kwebhomba pane substrate hakusi zvakare. Pamusoro pezvo, nekuda kweiyo erekitironi neinongedzo yemagineti zvipingamupinyi, munzvimbo inotarirwa yemagineti mhedzisiro yedunhu iri mukati menzira yekuyerera iyi diki diki renzvimbo yekuisa maerekitironi yakakwira zvakanyanya, uye mune magineti mhedzisiro yedunhu riri kunze kweiyo substrate surface, kunyanya kure nemagnetic padhuze nepamusoro, iyo electron concentration nekuda kwekupararira kweiyo yakaderera uye yakaenzana kugovera kwemaitiro maviri ekushanda, uye kunyange kuderera kweanoshanda madhipatimendi. mutsauko wepressure yehurongwa hwehukuru). The low density of electrons bombarding surface of the substrate, zvokuti bombardment ye substrate inokonzerwa nekudzika kwekushisa, iyo ndiyo nzira huru yemagnetron sputtering substrate substrate kukwira kwakaderera. Mukuwedzera, kana pane nzvimbo yemagetsi chete, maerekitironi anosvika kune anode mushure mechinguva chiduku, uye mukana wekudhumhana negasi rinoshanda inongova 63.8%. Uye wedzera magineti, maerekitironi mukufamba kuenda kune anode kuita spiral motion, iyo magineti yakasungwa uye kuwedzera trajectory yemaerekitironi, ichivandudza zvakanyanya mukana wekudhumhana kwemaerekitironi uye kushanda magasi, ayo anokurudzira zvikuru kuitika kweionization, ionization uyezve zvakare kugadzira maerekitironi zvakare kujoina muitiro wekudhumhana nekuwedzera, kurongeka kwakawanda. kushandiswa kunobudirira kwesimba rema electrons, uye nokudaro mukugadzirwa kwepamusoro-density Kuwedzera kweplasma kunowedzera mukupenya kusinganzwisisiki kubuda kweplasma. Chiyero chekuburitsa maatomu kubva pane chakanangwa chinowedzerwawo, uye kuputika kwechinangwa kunokonzerwa nekubhomba kwechinangwa nemaoni akanaka kunonyanya kushanda, ndicho chikonzero chepamusoro-soro ye magnetron sputtering deposition. Mukuwedzera, kuvapo kwemagnetic field kunogonawo kuita kuti sputtering system ishande pamhepo yakadzika, yakaderera 1 yemhepo inogona kuita maion munzvimbo ye sheath layer kuderedza kudhumhana, kubhomba kwechinangwa nesimba guru rekinetic, uye zuva rekukwanisa kuderedza maatomu akaputika uye kupindira kwegasi kusina zvematongerwo enyika, kudzivirira kudonhedzwa kwemaatomu kubva kumadziro akaiswa kumashure. pamusoro, kuvandudza mwero uye kunaka kweiyo yakaonda firimu deposition.

Iyo inonangwa magineti inogona kunyatso kumanikidza trajectory yemaerekitironi, iyo inozokanganisa maitiro eplasma uye kunyura kwemaion pane chinangwa.

Trace: kuwedzera kufanana kwechinangwa chemagnetic field inogona kuwedzera kufanana kwechinangwa chepamusoro etching, nekudaro kunatsiridza kushandiswa kwezvinhu zvakanangwa; inonzwisisika electromagnetic munda kugovera kunogona zvakare kuvandudza kugadzikana kweiyo sputtering maitiro. Naizvozvo, kune magnetron sputtering target, ukuru uye kugovera kwemagnetic field kwakakosha zvakanyanya.

-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua