ʻO ke kuleana o ke kahua mākēneki i ka hoʻoulu ʻana o Magnetron

Hoʻopili ka Magnetron sputtering i ka lawe plasma hoʻokuʻu, etching target, deposition kiʻiʻoniʻoni ʻoniʻoni a me nā kaʻina hana ʻē aʻe, e loaʻa ka hopena i ke kahua magnetic ma ke kaʻina hana sputtering magnetron. I loko o ka magnetron sputtering system a me orthogonal magnetic field, pili nā electrons i ke kuleana o ka ikaika Lorentz a hana i ka neʻe ʻana o ka spiral trajectory, pono e hoʻomau i ka hui ʻana e neʻe mālie i ka anode, ma muli o ka hui ʻana o nā electrons e hiki i ka anode ma hope o ka liʻiliʻi o ka ikehu, ʻaʻole nui ka wela o ka bombardment ma ka substrate. Eia kekahi, ma muli o ke kaohi o ka electron e ka mea i hoʻopaʻa ʻia, ma ka ʻili o ka hopena magnetic o ka ʻāina i loko o ke ala hoʻokuʻu i kēia wahi liʻiliʻi liʻiliʻi o ka electron concentration kiʻekiʻe loa, a ma ka hopena magnetic o ka ʻāina ma waho o ka substrate surface, ʻoi aku ka mamao mai ke kahua magnetic kokoke i ka ʻili, ka ʻike electron ma muli o ka hoʻopuehu ʻana o ka haʻahaʻa haʻahaʻa a me ke ʻano like ʻole o ka puʻu ʻana o ke kinoea. he kauoha o ka nui). ʻO ka haʻahaʻa haʻahaʻa o nā electrons bombarding i ka ʻili o ka substrate, i mea e haʻahaʻa ai ka bombardment o ka substrate ma muli o ka piʻi ʻana o ka wela haʻahaʻa, ʻo ia ka mea nui o ka magnetron sputtering substrate piʻi haʻahaʻa. Eia kekahi, inā he kahua uila wale nō, hiki i nā electrons i ka anode ma hope o kahi mamao pōkole loa, a ʻo 63.8% wale nō ka hopena o ka hui ʻana me ke kinoea hana. A hoʻohui i ka māla magnetic, nā electrons i ke kaʻina o ka neʻe ʻana i ka anode e hana i ka neʻe spiral, hoʻopaʻa ʻia ka māla magnetic a hoʻonui i ka trajectory o nā electrons, e hoʻomaikaʻi nui i ka hiki o ka hui ʻana o nā electrons a me nā kinoea hana, ka mea e hoʻoikaika nui ai i ka hiki ʻana o ka ionization, ionization a laila hana hou i nā electrons e hui pū me ke kaʻina hana o ka collision, hiki ke hoʻonui ʻia ka hopena o ka hoʻohana ʻana i ka ikehu. nā electrons, a pēlā i ka hoʻokumu ʻana i ke kiʻekiʻe kiʻekiʻe Ke piʻi aʻe ka nui o ka plasma i ka hoʻokuʻu ʻana o ka glow anomalous o ka plasma. Hoʻonui pū ʻia ka nui o ka sputtering i nā atom mai ka pahu hopu, a ʻoi aku ka maikaʻi o ka sputtering target ma muli o ka pahū ʻana o ka pahu e nā ion maikaʻi, ʻo ia ke kumu o ka kiʻekiʻe o ka hoʻoheheʻe ʻana o ka magnetron. Eia kekahi, hiki i ka hele ʻana o ka māla magnetic ke hana i ka ʻōnaehana sputtering e hana ana ma ka haʻahaʻa haʻahaʻa o ke ea, haʻahaʻa 1 no ke kaomi ʻana o ka ea hiki ke hana i nā ion i loko o ka ʻāpana sheath layer e hōʻemi ai i ka hui ʻana, ka hoʻomake ʻana o ka pahu hopu me ka ikehu kinetic nui, a me ka lā e hiki ai ke hōʻemi i ka sputtered target atoms a me ka hui ʻana o ke kinoea kūʻokoʻa, e pale ai i nā atoms i hoʻopuʻi ʻia i ka pā o ka mea i hoʻopuʻi ʻia. a me ka maikaʻi o ka waiho ʻana o ke kiʻi lahilahi.

Hiki ke hoʻopaʻa maikaʻi ʻia ke kahua magnetic i ka trajectory o nā electrons, a laila e hoʻopilikia i nā waiwai plasma a me ka etching o nā ion ma ka pahu hopu.

Trace: hoʻonui i ka like ʻole o ka pākuʻi mākaʻikaʻi e hiki ke hoʻonui i ka like ʻole o ka etching surface target, pēlā e hoʻomaikaʻi ai i ka hoʻohana ʻana i ka mea i manaʻo ʻia; Hiki ke hoʻomaikaʻi maikaʻi i ka paʻa o ka sputtering kaʻina hana electromagnetic kūpono. No laila, no ka magnetron sputtering target, ʻo ka nui a me ka hāʻawi ʻana o ka māla magnetic he mea nui loa.

-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua