Injin fitar da iskar gas mai amfani da iskar gas (vacuum magnetron sputtering) ya dace musamman don shafa mai a cikin ruwa. A gaskiya ma, wannan tsari zai iya sanya siririn fim na kowane kayan oxide, carbide, da nitride. Bugu da ƙari, tsarin ya kuma dace musamman don sanya tsarin fim mai faɗi da yawa, gami da ƙirar gani, fina-finan launi, fenti mai jure lalacewa, nano-laminates, fenti mai ƙarfi, fina-finan rufewa, da sauransu. Tun farkon 1970, an ƙirƙiri misalan adana fim mai inganci don nau'ikan kayan fim mai haske. Waɗannan kayan sun haɗa da kayan sarrafawa masu haske, semiconductors, polymers, oxides, carbides, da nitrides, yayin da ake amfani da fluorides a cikin hanyoyin kamar shafa mai ƙafe.
Babban fa'idar tsarin magnetron sputtering shine amfani da hanyoyin shafa mai amsawa ko wanda ba mai amsawa ba don sanya yadudduka na waɗannan kayan da kuma kula da tsarin Layer, kauri na Film, daidaiton kauri na Film da kuma halayen injiniya na Layer. Tsarin yana da halaye kamar haka.
1、Babban adadin ajiya. Saboda amfani da na'urorin lantarki masu saurin gaske, ana iya samun babban kwararar ion, wanda ke inganta ƙimar ajiya da ƙimar sputtering na wannan tsarin shafi yadda ya kamata. Idan aka kwatanta da sauran hanyoyin rufewa, magnetron sputtering yana da babban ƙarfin aiki da yawan amfanin ƙasa mai yawa, kuma ana amfani da shi sosai a cikin samar da masana'antu daban-daban.
2, Ingantaccen ƙarfin lantarki. Maƙallin sputtering na Magnetron gabaɗaya yana zaɓar ƙarfin lantarki a cikin kewayon 200V-1000V, yawanci shine 600V, saboda ƙarfin lantarki na 600V yana cikin mafi girman kewayon ingantaccen ƙarfin lantarki.
3. Ƙarfin fitar da iska mai ƙarancin ƙarfi. Ana amfani da ƙarfin lantarki mai ƙarfi na magnetron ƙasa da ƙasa, kuma filin maganadisu yana iyakance plasma kusa da cathode, wanda ke hana ƙwayoyin da ke ɗauke da ƙarfi mai yawa su fara harbawa zuwa saman substrate.
4, Ƙananan zafin substrate. Ana iya amfani da anode don jagorantar electrons da aka samar yayin fitarwa, babu buƙatar kammala tallafin substrate, wanda zai iya rage fashewar electrons na substrate yadda ya kamata. Don haka zafin substrate ɗin yana da ƙasa, wanda ya dace sosai ga wasu filastik waɗanda ba su da juriya ga rufin zafi mai yawa.
5, Busar da saman da aka yi niyya ta Magnetron sputtering ba iri ɗaya ba ne. Busar da saman da aka yi niyya ta Magnetron sputtering ba iri ɗaya ba ne saboda rashin daidaiton filin maganadisu na abin da aka yi niyya. Wurin da aka yi niyya ta hanyar busar da maƙasudin ya fi girma, don haka ingantaccen ƙimar amfani da abin da aka yi niyya ya yi ƙasa (kashi 20-30% kawai na amfani). Saboda haka, don inganta amfani da abin da aka yi niyya, ana buƙatar canza rarraba filin maganadisu ta wasu hanyoyi, ko kuma amfani da maganadisu da ke motsawa a cikin cathode na iya inganta amfani da abin da aka yi niyya.
6、Manufar Haɗaɗɗiya. Zai iya yin fim ɗin haɗin gwiwa na haɗin gwiwa. A halin yanzu, an yi nasarar shafa amfani da tsarin haɗakar magnetron manufa sputtering akan fim ɗin haɗin gwiwa na Ta-Ti, (Tb-Dy)-Fe da Gb-Co. Tsarin haɗin gwiwa yana da nau'ikan guda huɗu, bi da bi, sune manufa mai zagaye, manufa mai siffar murabba'i, ƙaramin manufa mai siffar murabba'i da manufa mai siffar fanka. Amfani da tsarin haɗin gwiwa na ɓangaren ya fi kyau.
7. Faɗin aikace-aikace. Tsarin fesawa na Magnetron na iya sanya abubuwa da yawa, waɗanda aka fi sani sune: Ag, Au, C, Co, Cu, Fe, Ge, Mo, Nb, Ni, Os, Cr, Pd, Pt, Re, Rh, Si, Ta, Ti, Zr, SiO, AlO, GaAs, U, W, SnO, da sauransu.
Magnetron sputtering yana ɗaya daga cikin hanyoyin shafa fenti da aka fi amfani da su don samun fina-finai masu inganci. Tare da sabon cathode, yana da babban amfani da manufa da kuma yawan adanawa. Tsarin shafa fenti na magnetron sputtering na fasahar Guangdong Zhenhua yanzu ana amfani da shi sosai a cikin shafa fenti na manyan wurare. Ba wai kawai ana amfani da wannan hanyar don adana fim mai layi ɗaya ba, har ma don shafa fim mai layi da yawa, ban da haka, ana amfani da shi a cikin aiwatar da yin birgima don yin fim ɗin marufi, fim ɗin gani, lamination da sauran murfin fim.
Lokacin Saƙo: Mayu-31-2024