ZCL0608

Cov khoom siv sib xyaw ua ke magnetron sputtering thiab tiv thaiv evaporation thev naus laus zis, thiab muab kev daws teeb meem rau kev txheej ntau yam sib txawv substrates.
Cov khoom siv txheej txheem sim feem ntau yog siv rau hauv cov tsev kawm qib siab thiab cov tsev kawm tshawb fawb, thiab tuaj yeem ua tau raws li ntau yam kev xav tau ntawm kev sim. Ntau lub hom phiaj kev tsim kho tau tshwj tseg rau cov khoom siv, uas tuaj yeem teeb tsa tau yooj yim kom ua tau raws li kev tshawb fawb thiab kev txhim kho hauv ntau qhov chaw sib txawv. Magnetron sputtering system, cathode arc system, electron beam evaporation system, resistance evaporation system, CVD, PECVD, ion source, bias system, heating system, three-dimensional fixture, thiab lwm yam tuaj yeem xaiv tau. Cov neeg siv khoom tuaj yeem xaiv raws li lawv cov kev xav tau sib txawv.
Cov khoom siv muaj cov yam ntxwv ntawm qhov zoo nkauj, cov qauv me me, thaj chaw hauv pem teb me me, qib siab ntawm kev ua haujlwm tsis siv neeg, kev ua haujlwm yooj yim thiab yoog raws, kev ua haujlwm ruaj khov thiab kev saib xyuas yooj yim.
Cov khoom siv no siv tau rau cov yas, hlau tsis xeb, cov khoom siv hluav taws xob / cov khoom yas, iav, ceramics thiab lwm yam khoom siv. Cov txheej hlau yooj yim xws li titanium, chromium, nyiaj, tooj liab, txhuas lossis cov yeeb yaj kiab hlau xws li TiN / TiCN / TiC / TiO2 / TiAlN / CrN / ZrN / CrC tuaj yeem npaj tau.