Hoʻopaʻa ʻia i ka mahu kino

ʻO ka ulu ʻana o ka epitaxial, i kapa ʻia ʻo epitaxy, ʻo ia kekahi o nā kaʻina hana nui i ka hana ʻana i nā mea semiconductor a me nā mea hana. ʻO ka mea i kapa ʻia ʻo ka ulu ʻana epitaxial i kekahi mau kūlana i ka substrate aniani hoʻokahi ma luna o ka ulu ʻana o kahi papa o ke kaʻina hana kiʻi ʻoniʻoni hoʻokahi, ʻo ka ulu ʻana o ke kiʻi ʻoniʻoni hoʻokahi i kapa ʻia ʻo epitaxial layer epitaxial ʻenehana i ka 1960s mua i ka noiʻi kiʻi ʻoniʻoni ʻoniʻoni hoʻokahi-crystal ma ke kumu o ka puka ʻana mai o ka ulu ʻana o kahi kokoke i ka hapalua kenekulia i kēia manawa, ua hiki i nā poʻe ke hoʻomohala i nā kūlana semiconic i kēia manawa. ulu ana. Ua hoʻoponopono ka ʻenehana Epitaxial i nā pilikia he nui i nā ʻāpana ʻokoʻa semiconductor a me nā kaapuni i hoʻohui ʻia, e hoʻomaikaʻi nui ana i ka hana o ka hāmeʻa. Hiki i ke kiʻiʻoniʻoni Epitaxial ke hoʻomalu pono i kona mānoanoa a me nā waiwai doping, ua alakaʻi kēia hiʻohiʻona i ka hoʻomohala wikiwiki ʻana o nā kaapuni hoʻohui semiconductor, i kahi pae kūpono loa. Silicon one crystal ma ka slicing, grinding, polishing and other processing techniques, to get polished sheet, you can make discrete parts and integrated circuit on it. Akā i nā manawa he nui kēia pepa i poni wale ʻia ma ke ʻano he kākoʻo mechanical no ka substrate, kahi e pono ai e ulu mua i kahi papa o ka kiʻi ʻoniʻoni hoʻokahi me ke ʻano kūpono o ka conductivity a me ka resistivity, a laila nā ʻāpana discrete a i ʻole nā ​​​​kaapuni i hoʻohui ʻia i hana ʻia i kahi kiʻi ʻoniʻoni hoʻokahi. Hoʻohana ʻia kēia ʻano hana, no ka laʻana, i ka hana ʻana i nā transistors mana kiʻekiʻe kiʻekiʻe kiʻekiʻe kiʻekiʻe, e hoʻonā i ka paio ma waena o ka voltage breakdown a me ke kūpaʻa series. Pono ka mea hōʻiliʻili o ka transistor i ka uila haʻihaʻi kiʻekiʻe, i hoʻoholo ʻia e ka resistivity o ka pn junction o ka wafer silicon. No ka hoʻokōʻana i kēia koi, pono nā mea kū'ē kiʻekiʻe. Ka poʻe i loko o ka nui doped n-ʻano haʻahaʻa-kū'ē mea ma luna o ka epitaxial nui a hiki i ke kakini microns mānoanoa māmā doped kiʻekiʻe-kū'ē 'ano papa, transistor hana i loko o ka epitaxial papa, ka mea e hoʻonā i ka kiʻekiʻe breakdown uila koi 'ia e ka kiʻekiʻe resistivity a me ka haʻahaʻa collector moʻo kū'ē koi 'ia e ka haʻahaʻa substrate resistivity o ka contradiction ma waena o.

ʻO ka ulu ʻana o ka epitaxial gas-phase ka noi mua loa i ka semiconductor field o kahi ʻenehana ulu epitaxial ʻoi aku ka nui, kahi mea nui i ka hoʻomohala ʻana i ka ʻepekema semiconductor, hāʻawi nui i ka maikaʻi o nā mea semiconductor a me nā mea hana a me kā lākou hana hoʻomaikaʻi. I kēia manawa, ʻo ka hoʻomākaukau ʻana i ka kiʻiʻoniʻoni epitaxial kristal hoʻokahi semiconductor ke ʻano koʻikoʻi o ka waiho ʻana o ka mahu. ʻO ka mea i kapa ʻia ʻo chemical vapor deposition, ʻo ia hoʻi, ka hoʻohana ʻana i nā mea kinoea ma ka ʻili paʻa o ka hopena kemika, ke kaʻina hana o ka hoʻokumu ʻana i nā waihona paʻa. Hiki i ka ʻenehana CVD ke ulu i nā kiʻi ʻoniʻoni kiʻekiʻe kiʻekiʻe, e kiʻi i ke ʻano doping pono a me ka mānoanoa epitaxial, maʻalahi e ʻike i ka hana nui, a no laila ua hoʻohana nui ʻia i ka ʻoihana. Ma ka ʻoihana, ʻo ka wafer epitaxial i hoʻomākaukau ʻia e CVD he hoʻokahi a ʻoi aʻe paha nā papa i kanu ʻia, hiki ke hoʻohana ʻia e hoʻomalu i ke ʻano o ka mea hana a me ka hāʻawi ʻana i ka doping ma o ka diffusion a i ʻole ka hoʻokomo ʻana i ka ion; ʻokoʻa nā waiwai kino o ka papa epitaxial CVD me nā mea nui, a ʻo ka oxygen a me ka carbon content o ka papa epitaxial he haʻahaʻa loa, ʻo ia kona pono. Eia naʻe, maʻalahi ka papa epitaxial CVD e hana i ka self-doping, i nā noi hana pono e lawe i kekahi mau mea e hōʻemi i ka papa epitaxial o ka self-doping, CVD ʻenehana i kekahi mau ʻano o ke kaʻina hana empirical, pono e hana hou i ka noiʻi hohonu, no laila e hoʻomau ka loaʻa ʻana o ka ulu ʻana o ka ʻenehana CVD.

He paʻakikī loa ka ulu ʻana o ka CVD, i ka hopena kemika e loaʻa i nā ʻāpana like ʻole a me nā mea, hiki ke hana i nā huahana waena, a he nui nā ʻano kūʻokoʻa kūʻokoʻa, e like me ka mahana, ke kaomi, ka holo ʻana o ke kinoea, a me nā mea ʻē aʻe. ʻO ke kaʻina hana epitaxial he nui nā ʻanuʻu holomua, hoʻonui ʻia a hoʻokō pono. No ke kālailai ʻana i ke kaʻina hana a me ke ʻano o ka ulu ʻana o ka epitaxial CVD, ʻo ka mea mua, e wehewehe i ka solubility o nā mea reactive i ka pae kinoea, ka equilibrium partial pressure o nā kinoea like ʻole, nā kaʻina hana kinetic a me thermodynamic; a laila e hoʻomaopopo i nā kinoea reactive mai ka pae kinoea a hiki i ka ʻili o ka substrate mass transport, ka hoʻokumu ʻana o ka pae palena o ke kahe kinoea a me ka ʻili o ka substrate, ka ulu ʻana o ka nucleus, a me ka hopena o ka ʻili, diffusion a me ka neʻe ʻana, a pēlā e hoʻopuka ai i ke kiʻi makemake. I ke kaʻina hana ulu o CVD, hoʻokō ka hoʻomohala ʻana a me ka holomua o ka reactor i kahi hana koʻikoʻi, kahi e hoʻoholo nui ai i ka maikaʻi o ka papa epitaxial. ʻO ka morphology ili o ka papa epitaxial, nā hemahema lattice, ka hāʻawi ʻana a me ka mālama ʻana i nā haumia, ka mānoanoa a me ka like ʻole o ka papa epitaxial e pili pono i ka hana a me ka hua.

-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua