Usoro mkpuchi oghere bụ teknụzụ a na-eji etinye ihe nkiri dị mkpa ma ọ bụ mkpuchi n'elu elu na gburugburu oghere. Usoro a na-eme ka mkpuchi dị elu, uwe, na nke na-adịgide adịgide, nke dị oké mkpa na ụlọ ọrụ dị iche iche dị ka ngwá electronic, optics, automotive, na aerospace. Enwere ụdị mkpuchi mkpuchi oghere dị iche iche, nke ọ bụla dabara maka ngwa akọwapụtara. Nke a bụ ụdị igodo ole na ole:
Ntụkwasị mmiri nke anụ ahụ (PVD): Usoro a gụnyere mbufe anụ ahụ nke ihe sitere na isi iyi siri ike ma ọ bụ mmiri mmiri gaa na mkpụrụ. Ụzọ ndị a na-ahụkarị gụnyere:
Ịgbasa: A na-achụpụ ihe site na ebumnuche ma tinye ya na mkpụrụ.
Evaporation: A na-ekpocha ihe dị ọkụ ruo mgbe ọ na-ekupụ wee gbanye na mkpụrụ.
Mkpokọta vapor kemịkalụ (CVD): Usoro a gụnyere mmeghachi omume kemịkalụ n'etiti vapor-phase precursor na elu mkpụrụ, na-akpụ ihe nkiri siri ike. Ọdịiche gụnyere:
Plasma-Enhanced CVD (PECVD): Na-eji plasma kwalite mmeghachi omume kemịkal.
Metal-Organic CVD (MOCVD): Na-eji ogige igwe-organic dị ka ndị na-ebu ụzọ.
Atomic Layer Deposition (ALD): Usoro a na-achịkwa nke ukwuu nke na-etinye akwa atomic n'otu n'otu, na-ahụ na ọkpụrụkpụ na nhazi.
Magnetron sputtering: Ụdị PVD ebe a na-eji oghere ndọta na-egbochi plasma, na-abawanye arụmọrụ nke usoro mgbasa ozi.
Ion Beam Deposition: Na-eji ion beams fesa ihe sitere na ebumnuche wee tinye ya na mkpụrụ.
Ngwa:
Semiconductors: mkpuchi maka microchips na ngwa eletrọnịkị.
Optics: mkpuchi na-emegide ihe na-atụgharị uche, enyo, na anya m.
Automotive: mkpuchi maka akụrụngwa injin na ihe eji achọ mma.
Aerospace: mkpuchi ihe mgbochi okpomọkụ na akwa mkpuchi.
Uru:
Mkpuchi Uniform: Na-enweta ọkpụrụkpụ na nhazi na-agbanwe agbanwe n'ofe mkpụrụ.
Elu Adhesion: mkpuchi na-akwado nke ọma na mkpụrụ, na-eme ka ike dị ogologo.
Ịdị Ọcha na Ogo: Mpaghara oghere na-ebelata mmetọ, na-ebute mkpuchi dị elu dị ọcha.
–E wepụtara akụkọ aonye na-emepụta igwe mkpuchi ikukuGuangdong Zhenhua
Oge nzipu: Jul-09-2024