Dhinaca kaydinta filimada khafiifka ah, tiknoolajiyada sputtering waxay noqotay hab si weyn loo isticmaalo si loo gaaro filimaan khafiif ah oo sax ah oo isku mid ah warshado kala duwan. Kala duwanaanta iyo kalsoonida tiknoolajiyadani waxay ballaarisaa codsiyadooda, taasoo u oggolaanaysa injineerada iyo cilmi-baarayaasha inay u habeeyaan filimada khafiifka ah ujeedooyin gaar ah. Qoraalkan baloogga ah, waxaan si qoto dheer u eegi doonnaa noocyada kala duwan ee tiknoolajiyada sputtering ee sida caadiga ah loo isticmaalo maanta, annagoo sharraxayna astaamahooda gaarka ah, faa'iidooyinkooda iyo codsiyadooda.
1. Shubashada DC
Shubitaanka DC waa mid ka mid ah farsamooyinka ugu fudud uguna isticmaalka badan ee lagu kaydiyo filimka khafiifka ah. Hawshu waxay ku lug leedahay isticmaalka isha korontada DC si loo soo saaro dheecaan dhalaalaya jawi gaas oo cadaadis hooseeya leh. Ayoonada togan ee ku jira balaasmaha ayaa duqeeya walxaha la beegsanayo, iyagoo kala furfuraya atamka oo ku shubaya substrate-ka. Shubitaanka DC waxaa loo yaqaanaa fudeydkiisa, kharash-oolnimada, iyo awoodda uu u leeyahay inuu ku shubo filimada khafiifka ah ee tayada sare leh substrate-yo kala duwan, oo ay ku jiraan galaaska, dhoobada, iyo biraha.
Codsiyada sputtering DC:
- Soo saarista Semiconductor-ka
- Dahaarka indhaha
- Unugyada qorraxda ee khafiifka ah
2. Soo noqnoqoshada Raadiyaha iyo Sputtering-ka Falcelinta
Kala-soocidda Soo noqnoqoshada Raadiyaha (RF) waa nooc ka caawiya awoodda RF ee kala-soocidda DC. Habkan, walxaha la beegsanayo waxaa lagu duqeeyaa ion-yada ay soo saaraan awoodda soo noqnoqoshada raadiyaha. Joogitaanka goobta RF waxay kor u qaaddaa habka ionization-ka, taasoo u oggolaanaysa xakamaynta saxda ah ee halabuurka filimka. Dhanka kale, kala-soocidda falcelinta waxay ku lug leedahay soo-gelinta gaas falgal ah, sida nitrogen ama oksijiin, qolka kala-soocidda. Tani waxay suurtogal ka dhigaysaa sameynta filimaan khafiif ah oo isku-dhafan, sida oksaydhyada ama nitrides, oo leh sifooyin walax oo la xoojiyay.
Codsiyada RF iyo Spruttering-ka Falcelinta:
- Dahaarka ka hortagga milicsiga
- Caqabadda Semiconductor-ka
- Hagayaasha hirarka indhaha
3. Buufinta Magnetron-ka
Kala-baxa Magnetron waa doorasho caan ah oo loogu talagalay dhigista heerka sare. Tiknoolajiyaddani waxay isticmaashaa goob birlab ah oo u dhow dusha bartilmaameedka si loo kordhiyo cufnaanta balaasmaha, taasoo keenta hufnaan ionization oo sare iyo isku-dhejin filim khafiif ah oo aad u fiican. Goobta birlabka ee dheeraadka ah waxay xaddidaysaa balaasmaha u dhow bartilmaameedka, taasoo yaraynaysa isticmaalka bartilmaameedka marka la barbar dhigo hababka kala-baxa caadiga ah. Kala-baxa Magnetron wuxuu hubiyaa heerarka dhigista oo sarreeya iyo sifooyinka dahaarka oo sarreeya, taasoo ka dhigaysa mid ku habboon wax-soo-saarka baaxadda weyn.
Isticmaalka magnetron sputtering:
- transistor filim khafiif ah
- Warbaahinta kaydinta birlabta
- Dahaarka qurxinta ee galaaska iyo birta
4. Buufinta shucaaca Ion-ka
Kala-soocidda shucaaca Ion beam sputtering (IBS) waa farsamo loo isticmaalo in lagu buufiyo walxaha bartilmaameedka ah iyadoo la adeegsanayo shucaaca ion beam. IBS waa mid aad loo xakameyn karo, taasoo u oggolaanaysa xakamaynta dhumucda filimka saxda ah iyo yareynta khasaaraha walxaha. Tiknoolajiyaddani waxay hubinaysaa isku-dhafka saxda ah ee stoichiometric iyo heerarka wasakhowga oo hooseeya. Iyada oo leh midnimada filimka ee aadka u fiican iyo xulashada ballaaran ee walxaha bartilmaameedka ah, IBS waxay soo saari kartaa filimaan siman oo aan cillad lahayn, taasoo ka dhigaysa mid ku habboon codsiyada gaarka ah.
Codsiyada Ion Beam Sputtering:
- Muraayadda X-ray
- Shaandheeyayaasha indhaha
- Dahaarka ka hortagga xirashada iyo is-qabqabsiga hooseeya
gunaanad ahaan
Dunida tignoolajiyada sputtering waa mid aad u ballaaran oo kala duwan, taasoo siinaysa injineerada iyo cilmi-baarayaasha fursado badan oo loogu talagalay kaydinta filimada khafiifka ah. Aqoonta noocyada kala duwan ee farsamooyinka sputtering iyo codsiyadooda waa lama huraan si loo gaaro sifooyinka filimada khafiifka ah ee ugu fiican iyadoo loo eegayo shuruudaha gaarka ah. Laga bilaabo sputtering DC fudud ilaa sputtering saxda ah ee ion beam, hab kastaa wuxuu door muhiim ah ka ciyaaraa warshado badan, isagoo gacan ka geysanaya horumarinta tignoolajiyada casriga ah.
Markaan fahanno horumarkii ugu dambeeyay ee tignoolajiyada sputtering, waxaan ka faa'iideysan karnaa awoodda filimada khafiifka ah si aan u daboolno baahiyaha sii kordhaya ee warshadaha casriga ah. Hadday tahay qalabka elektaroonigga ah, qalabka elektaroonigga ah ama agabka horumarsan, tignoolajiyada sputtering waxay sii waddaa inay qaabeyso habka aan u naqshadeyno una soo saarno tignoolajiyada berri.
Waqtiga boostada: Agoosto-15-2023