I-Hot filament CVD iyindlela yokuqala nethandwa kakhulu yokukhulisa idayimane ngokucindezela okuphansi. 1982 Matsumoto nabanye bafudumeza i-refractory metal filament ibe ngaphezu kuka-2000°C, lapho izinga lokushisa igesi ye-H2 edlula ku-filament ikhiqiza kalula ama-athomu e-hydrogen. Ukukhiqizwa kwe-athomu hydrogen ngesikhathi se-hydrocarbon pyrolysis kwandisa izinga lokufakwa kwamafilimu edayimane. Idayimane ifakwa ngokukhetha futhi ukwakheka kwe-graphite kuyavinjelwa, okuholela emazingeni okufakwa kwamafilimu edayimane ngokulandelana kwe-mm/h, okuyizinga eliphezulu kakhulu lokufakwa kwezindlela ezivame ukusetshenziswa embonini. I-HFCVD ingenziwa kusetshenziswa imithombo ehlukahlukene yekhabhoni, njenge-methane, i-propane, i-acetylene, namanye ama-hydrocarbon, ngisho namanye ama-hydrocarbon aqukethe umoya-mpilo, njenge-acetone, i-ethanol, ne-methanol. Ukwengezwa kwamaqembu aqukethe umoya-mpilo kwandisa izinga lokushisa lokufakwa kwedayimane.
Ngaphezu kohlelo olujwayelekile lwe-HFCVD, kunezinguquko eziningana ohlelweni lwe-HFCVD. Oluvame kakhulu uhlelo lwe-DC plasma kanye ne-HFCVD oluhlanganisiwe. Kulolu hlelo, i-voltage ye-bias ingasetshenziswa ku-substrate kanye ne-filament. I-bias ehlala njalo ku-substrate kanye ne-bias ethile engemihle ku-filament kubangela ukuthi ama-electron ahlasele i-substrate, okuvumela i-hydrogen engaphezulu ukuthi isuse i-sorb. Umphumela wokususa i-sorb ukwanda kwesilinganiso sokufakwa kwefilimu yedayimane (cishe i-10 mm/h), inqubo eyaziwa ngokuthi i-HFCVD essisted electron. lapho i-voltage ye-bias iphakeme ngokwanele ukudala ukukhishwa kwe-plasma okuzinzile, ukubola kwe-H2 kanye nama-hydrocarbon kuyanda kakhulu, okuholela ekukhuleni kwesilinganiso sokukhula. Lapho i-polarity ye-bias ibuyiselwa emuva (i-substrate isuselwe ekungafanele), ukuqhunyiswa kwe-ion kwenzeka ku-substrate, okuholela ekwandeni kwe-nucleation yedayimane ku-substrates ezingezona idayimane. Olunye ushintsho ukufaka esikhundleni sentambo eyodwa eshisayo ngentambo eziningana ezahlukene ukuze kufezwe ukufakwa okufanayo futhi ekugcineni kube nendawo enkulu yefilimu yedayimane. Ububi be-HFCVD ukuthi ukuhwamuka kokushisa kwentambo kungakha ukungcola kwifilimu yedayimane.
(2) I-Microwave Plasma CVD (MWCVD)
Ngawo-1970, ososayensi bathola ukuthi ukuhlushwa kwe-athomu hydrogen kungandiswa kusetshenziswa i-DC plasma. Ngenxa yalokho, i-plasma yaba enye indlela yokukhuthaza ukwakheka kwamafilimu edayimane ngokubolisa i-H2 ibe yi-athomu hydrogen bese kuqaliswa amaqembu e-athomu asekelwe ku-carbon. Ngaphezu kwe-DC plasma, ezinye izinhlobo ezimbili ze-plasma nazo ziye zathola ukunakwa. I-microwave plasma CVD inemvamisa yokuvuselela engu-2.45 GHZ, kanti i-RF plasma CVD inemvamisa yokuvuselela engu-13.56 MHz. Ama-microwave plasma ahlukile ngoba imvamisa ye-microwave ibangela ukudlidliza kwama-electron. Lapho ama-electron eshayisana nama-athomu egesi noma ama-molecule, kukhiqizwa izinga eliphezulu lokuhlukanisa. I-microwave plasma ivame ukubizwa ngokuthi into enama-electron “ashisayo”, ama-ion “abandayo” kanye nezinhlayiya ezingathathi hlangothi. Ngesikhathi sokufakwa kwefilimu encane, ama-microwave angena ekamelweni lokwenziwa kwe-CVD elithuthukisiwe ngefasitela. I-plasma ekhanyayo ngokuvamile iyindilinga ngesimo, futhi ubukhulu be-sphere buyanda ngamandla e-microwave. Amafilimu amancane edayimane akhuliswa endaweni engaphansi komhlaba ekhoneni lendawo ekhanyayo, futhi indawo engaphansi komhlaba akudingeki ukuthi ithintane ngqo nendawo ekhanyayo.
–Lesi sihloko sikhishwe yi-umenzi womshini wokumboza nge-vacuumI-Guangdong Zhenhua
Isikhathi sokuthunyelwe: Juni-19-2024