ʻO ke CVD filament wela ke ʻano mua loa a kaulana loa o ka ulu ʻana i ka daimana ma ke kaomi haʻahaʻa. 1982 Ua hoʻomehana ʻo Matsumoto et al. i kahi filament metala refractory ma luna o 2000°C, ma kahi mahana e hana maʻalahi ai ke kinoea H2 e hele ana ma o ka filament i nā ʻātoma hydrogen. ʻO ka hana ʻana o ka hydrogen atomic i ka wā o ka pyrolysis hydrocarbon i hoʻonui i ka helu waiho ʻana o nā kiʻiʻoniʻoni daimana. Hoʻokomo koho ʻia ka daimana a ua kāohi ʻia ka hoʻokumu ʻana o ka graphite, e hopena ana i nā helu waiho ʻana o ka kiʻiʻoniʻoni daimana ma ke kauoha o mm/h, he helu waiho kiʻekiʻe loa ia no nā ʻano hana i hoʻohana pinepine ʻia i ka ʻoihana. Hiki ke hana ʻia ka HFCVD me ka hoʻohana ʻana i nā ʻano kumu kalapona like ʻole, e like me ka methane, propane, acetylene, a me nā hydrocarbons ʻē aʻe, a me kekahi mau hydrocarbons i loaʻa ka oxygen, e like me ka acetone, ethanol, a me ka methanol. ʻO ka hoʻohui ʻana o nā hui i loaʻa ka oxygen e hoʻonui i ka pae mahana no ka waiho ʻana o ka daimana.
Ma waho aʻe o ka ʻōnaehana HFCVD maʻamau, aia kekahi mau hoʻololi i ka ʻōnaehana HFCVD. ʻO ka mea maʻamau ka hui pū ʻana o ka plasma DC a me ka ʻōnaehana HFCVD. Ma kēia ʻōnaehana, hiki ke hoʻopili ʻia kahi voltage bias i ka substrate a me ka filament. ʻO kahi bias maikaʻi mau ma ka substrate a me kahi bias maikaʻi ʻole ma ka filament e hoʻoulu ai i nā electrons e hoʻouka i ka substrate, e ʻae ana i ka hydrogen o ka ʻili e desorb. ʻO ka hopena o ka desorption he piʻi ʻana o ka helu deposition o ka ʻili daimana (ma kahi o 10 mm/h), kahi ʻenehana i ʻike ʻia ʻo electron-assisted HFCVD. i ka wā e lawa ai ke kiʻekiʻe o ka voltage bias e hana i kahi hoʻokuʻu plasma paʻa, piʻi nui ka decomposition o H2 a me nā hydrocarbons, kahi e alakaʻi ai i ka piʻi ʻana o ka ulu ʻana. Ke hoʻohuli ʻia ka polarity o ka bias (ua bias maikaʻi ʻole ka substrate), hana ʻia ka ion bombardment ma ka substrate, e alakaʻi ana i ka piʻi ʻana o ka nucleation daimana ma nā substrates ʻaʻole daimana. ʻO kekahi hoʻololi ʻē aʻe, ʻo ia ka hoʻololi ʻana o kahi filament wela hoʻokahi me kekahi mau filament like ʻole i mea e hoʻokō ai i ka waiho like ʻana a me kahi ʻāpana nui o ka ʻili daimana. ʻO ka hemahema o HFCVD, ʻo ka mahu wela o ka filament hiki ke hana i nā mea haumia i loko o ka ʻili daimana.
(2) Microwave Plasma CVD (MWCVD)
I nā makahiki 1970, ua ʻike nā kānaka ʻepekema hiki ke hoʻonui ʻia ka nui o ka hydrogen atomika me ka hoʻohana ʻana i ka plasma DC. ʻO ka hopena, ua lilo ka plasma i ʻano hana ʻē aʻe e hoʻolaha i ka hoʻokumu ʻia ʻana o nā kiʻiʻoniʻoni daimana ma ka hoʻokaʻawale ʻana iā H2 i loko o ka hydrogen atomika a me ka hoʻoulu ʻana i nā hui atomika i hoʻokumu ʻia i ke kalapona. Ma waho aʻe o ka plasma DC, ua loaʻa pū kekahi mau ʻano plasma ʻē aʻe i ka nānā ʻia. ʻO ka plasma microwave CVD he alapine hoʻonāukiuki o 2.45 GHZ, a ʻo ka plasma RF CVD he alapine hoʻonāukiuki o 13.56 MHz. He kū hoʻokahi nā plasma microwave ma muli o ka hoʻoulu ʻana o ka alapine microwave i nā haʻalulu electron. Ke kuʻi nā electrons me nā ʻātoma kinoea a i ʻole nā molekala, hana ʻia kahi helu dissociation kiʻekiʻe. Ua kapa pinepine ʻia ka plasma Microwave he mea me nā electrons "wela", nā ion "anuanu" a me nā ʻāpana neutral. I ka wā o ka waiho ʻana o ka kiʻiʻoniʻoni lahilahi, komo nā microwaves i loko o ke keʻena synthesis CVD i hoʻonui ʻia e ka plasma ma o ka puka makani. He ʻano poepoe ka plasma luminescent, a piʻi ka nui o ka sphere me ka mana microwave. Ua ulu ʻia nā ʻili lahilahi daimana ma luna o kahi substrate ma ke kihi o ka ʻāpana luminescent, a ʻaʻole pono ka substrate e hoʻopili pololei me ka ʻāpana luminescent.
–Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini uhi hakahakaGuangdong Zhenhua
Ka manawa hoʻouna: Iune-19-2024