I-Hot filament CVD yeyona ndlela yokuqala neyaziwayo yokukhulisa idayimani ngoxinzelelo oluphantsi. 1982 Matsumoto et al. bafudumeza i-refractory metal filament ukuya kuthi ga kwi-2000°C, apho ubushushu igesi ye-H2 edlula kwi-filament ivelisa ngokulula ii-athomu ze-hydrogen. Ukuveliswa kwe-atomic hydrogen ngexesha le-hydrocarbon pyrolysis kwandisa izinga lokufakwa kweefilimu zedayimani. Idayimani ifakwa ngokukhetha kwaye ukwakheka kwe-graphite kuyathintelwa, okubangela amazinga okufakwa kwefilimu yedayimani ngokomyalelo we-mm/h, eli lizinga eliphezulu kakhulu lokufakwa kweendlela ezisetyenziswa rhoqo kushishino. I-HFCVD inokwenziwa kusetyenziswa imithombo eyahlukeneyo yekhabhoni, efana ne-methane, i-propane, i-acetylene, kunye nezinye ii-hydrocarbon, kunye nezinye ii-hydrocarbons ezineoksijini, ezifana ne-acetone, i-ethanol, kunye ne-methanol. Ukongezwa kwamaqela aneoksijini kwandisa uluhlu lobushushu lokufakwa kwedayimani.
Ukongeza kwinkqubo eqhelekileyo ye-HFCVD, kukho utshintsho oluninzi kwinkqubo ye-HFCVD. Eyona ixhaphakileyo yinkqubo ye-DC plasma kunye ne-HFCVD edibeneyo. Kule nkqubo, i-voltage ye-bias ingasetyenziswa kwi-substrate nakwi-filament. I-bias ehlala ihleli kwi-substrate kunye ne-bias ethile engalunganga kwi-filament ibangela ukuba ii-electron ziqhume kwi-substrate, zivumele i-hydrogen yomphezulu ukuba ikhuphe i-sorb. Isiphumo sokufunxa kukunyuka kwesantya sokufakwa kwefilimu yedayimani (malunga ne-10 mm/h), indlela eyaziwa ngokuba yi-HFCVD encediswa yi-electron. xa i-voltage ye-bias iphezulu ngokwaneleyo ukwenza i-plasma discharge ezinzileyo, ukubola kwe-H2 kunye nee-hydrocarbons kuyanda kakhulu, okukhokelela ekugqibeleni ekwandeni kwesantya sokukhula. Xa i-polarity ye-bias iguqulwa (i-substrate ihlulwe kakubi), i-ion bombardment iyenzeka kwi-substrate, ekhokelela ekwandeni kwe-nucleation yedayimani kwi-substrates ezingezizo zedayimani. Olunye utshintsho kukutshintshwa kwe-filament enye eshushu ngee-filaments ezahlukeneyo ukuze kufunyanwe i-deposition efanayo kwaye ekugqibeleni kubekho indawo enkulu yefilimu yedayimani. Ingxaki ye-HFCVD kukuba ukufuma kobushushu be-filament kunokwenza izinto ezingcolisayo kwifilimu yedayimani.
(2) I-Microwave Plasma CVD (MWCVD)
Kwiminyaka yoo-1970, izazinzulu zafumanisa ukuba uxinaniso lwe-atomic hydrogen lunokwandiswa kusetyenziswa i-DC plasma. Ngenxa yoko, i-plasma yaba yindlela enye yokukhuthaza ukwenziwa kweefilimu zedayimani ngokubolisa i-H2 ibe yi-atomic hydrogen kunye nokusebenzisa amaqela e-atomic asekelwe kwikhabhoni. Ukongeza kwi-DC plasma, ezinye iintlobo ezimbini ze-plasma nazo ziye zafumana ingqalelo. I-microwave plasma CVD ine-excitation frequency ye-2.45 GHZ, kwaye i-RF plasma CVD ine-excitation frequency ye-13.56 MHz. Ii-microwave plasma zahlukile kuba i-microwave frequency ibangela ukungcangcazela kwee-electron. Xa ii-electron zingqubana nee-athomu zegesi okanye ii-molecules, kuveliswa izinga eliphezulu lokwahlukana. I-microwave plasma idla ngokubizwa ngokuba yi-matter ene-electron "ezishushu", ii-ion "ezibandayo" kunye namaqhekeza angathathi hlangothi. Ngexesha lokufakwa kwefilimu encinci, ii-microwave zingena kwigumbi lokwenziwa kwe-CVD eliphuculweyo ngefestile. I-plasma ekhanyayo ngokubanzi imile okwesipili, kwaye ubukhulu besphere buyanda ngamandla e-microwave. Iifilimu ezibhityileyo zedayimani zikhuliswa kwisiseko esikwikona yommandla okhanyayo, kwaye isiseko akufuneki sidibane ngqo nommandla okhanyayo.
–Eli nqaku likhutshwe nguumenzi womatshini wokugquma nge-vacuumGuangdong Zhenhua
Ixesha leposi: Juni-19-2024