CVD eriri ọkụ bụ ụzọ mbụ na nke kachasị ewu ewu iji kụọ diamond na obere nrụgide. 1982 Matsumoto et al. kpoo eriri ígwè na-adịghị ike ọkụ ruo ihe karịrị 2000°C, ebe okpomọkụ nke gas H2 na-agafe na filament ahụ na-emepụta atọm hydrogen ngwa ngwa. Mmepụta nke hydrogen atọm n'oge pyrolysis hydrocarbon mụbara ọnụego itinye ihe nkiri diamond. A na-etinye diamond n'ọnọdụ dị iche iche ma gbochie nhazi graphite, nke na-ebute ọnụego itinye ihe nkiri diamond n'usoro mm/h, nke bụ ọnụego itinye ihe dị elu maka ụzọ ndị a na-ejikarị eme ihe n'ụlọ ọrụ. Enwere ike iji ọtụtụ isi iyi carbon, dị ka methane, propane, acetylene, na hydrocarbons ndị ọzọ, yana ọbụna ụfọdụ hydrocarbons nwere oxygen, dị ka acetone, ethanol, na methanol. Mgbakwunye nke otu ndị nwere oxygen na-eme ka oke okpomọkụ maka itinye ihe diamond dịkwuo elu.
Na mgbakwunye na sistemụ HFCVD nkịtị, enwere ọtụtụ mgbanwe na sistemụ HFCVD. Nke kachasị bụ plasma DC na sistemụ HFCVD ejikọtara ọnụ. N'ime sistemụ a, enwere ike itinye voltaji bias na substrate na filament. Mbelata dị mma na substrate na ụfọdụ nsogbu na filament na-eme ka elektrọn mikpuo substrate ahụ, na-ekwe ka hydrogen dị n'elu gbapụ. Nsonaazụ nke mkpochapu bụ mmụba na ọnụego ntinye nke ihe nkiri diamond (ihe dị ka 10 mm/h), usoro a maara dị ka HFCVD nke electron-assisted. mgbe voltaji bias dị elu iji mepụta mwepụ plasma kwụsiri ike, mmebi nke H2 na hydrocarbons na-abawanye nke ukwuu, nke na-eduga na mmụba na ọnụego uto. Mgbe polarity nke bias tụgharịrị (substrate bụ ihe na-adịghị mma), bọmbụ ion na-eme na substrate ahụ, na-eduga na mmụba na nucleation diamond na substrates na-abụghị diamond. Mgbanwe ọzọ bụ iji ọtụtụ eriri dị iche iche dochie otu eriri ọkụ iji nweta otu ebe a na-edebe ihe na ya, nakwa iji nweta nnukwu ebe a na-etinye ihe nkiri diamond. Ihe na-adịghị mma nke HFCVD bụ na ikuku okpomọkụ nke eriri ahụ nwere ike imebi ihe nkiri diamond ahụ.
(2) Ngwa ndakwa nri Plasma CVD (MWCVD)
N'afọ 1970, ndị ọkà mmụta sayensị chọpụtara na enwere ike ịbawanye njupụta nke hydrogen atọm site na iji plasma DC. N'ihi ya, plasma ghọrọ ụzọ ọzọ iji kwalite mmepụta nke ihe nkiri diamond site na ịgbasa H2 ka ọ bụrụ hydrogen atọm ma mee ka otu atọm dabere na carbon rụọ ọrụ. Na mgbakwunye na plasma DC, ụdị plasma abụọ ndị ọzọ enwetawokwa nlebara anya. CVD plasma microwave nwere ugboro mkpali nke 2.45 GHZ, CVD plasma RF nwere ugboro mkpali nke 13.56 MHz. plasma microwave pụrụ iche n'ihi na ugboro microwave na-akpali mkpọtụ electron. Mgbe elektrọn na-adakọ na atọm gas ma ọ bụ molekul, a na-emepụta oke nkewa. A na-akpọkarị plasma microwave dị ka ihe nwere electrons "ọkụ", ions "oyi" na ihe ndị na-anọpụ iche. N'oge itinye ihe nkiri dị gịrịgịrị, microwaves na-abanye n'ime ụlọ mmepụta CVD nke plasma na-eme ka plasma dịkwuo mma site na windo. Plasma na-egbuke egbuke na-abụkarị okirikiri n'ụdị, nha nke sphere na-abawanye site na ike microwave. A na-akụ ihe nkiri dị gịrịgịrị nke nwere diamond n'elu ihe e ji kpuchie elu ya n'akụkụ nke mpaghara ahụ na-enwu enwu, ihe e ji kpuchie elu ya ekwesịghịkwa ịdị kpọmkwem na mpaghara ahụ na-enwu enwu.
–E bipụtara akụkọ a site n'aka onyeigwe mkpuchi igwe emeputa ihe mkpuchiGuangdong Zhenhua
Oge ozi: Jun-19-2024