Filament inopisa CVD ndiyo nzira yekutanga uye yakakurumbira yekukura dhaimani nemhepo yakaderera. 1982 Matsumoto nevamwe vake vakapisa filament yesimbi inodzivisa kupisa kusvika pamusoro pe2000°C, apo tembiricha iyo gasi reH2 rinopfuura nepafilament rinoburitsa maatomu ehydrogen zviri nyore. Kugadzirwa kweatomu hydrogen panguva yehydrocarbon pyrolysis kwakawedzera mwero wekuisa madhaimani mafirimu. Dhaimani inochengetwa nenzira yakasarudzwa uye kuumbwa kwegraphite kunodziviswa, zvichikonzera mwero wekuisa madhaimani mafirimu padanho re mm/h, inova mwero wekuisa madhaimani akawanda kwazvo kune nzira dzinowanzoshandiswa mumaindasitiri. HFCVD inogona kuitwa uchishandisa marudzi akasiyana-siyana ecarbon, akadai semethane, propane, acetylene, nedzimwe hydrocarbons, uye kunyange mamwe mahydrocarbons ane oxygen, akadai seacetone, ethanol, uye methanol. Kuwedzerwa kwemapoka ane oxygen kunowedzera tembiricha yekuisa madhaimani.
Pamusoro pehurongwa hweHFCVD hwakajairika, kune shanduko dzakawanda kune hurongwa hweHFCVD. Hunonyanya kushandiswa isystem yeDC plasma neHFCVD yakabatana. Muhurongwa uhwu, voltage ye bias inogona kushandiswa kune substrate ne filament. Kugara kuripo zvakanaka pane substrate uye imwe negative bias pane filament zvinoita kuti maerekitironi aputike pane substrate, zvichibvumira surface hydrogen kubvisa sorbent. Mhedzisiro yekubviswa kwe sorbent kuwedzera kwe deposition rate yedhaimani film (inenge 10 mm/h), nzira inozivikanwa se electron-assisted HFCVD. kana bias voltage yakakwira zvakakwana kugadzira stable plasma discharge, kuora kweH2 nemahydrocarbons kunowedzera zvakanyanya, izvo zvinozopedzisira zvaita kuti pave nekuwedzera kwe growth rate. Kana polarity ye bias ikadzoserwa kumashure (substrate haina negative bias), ion bombardment inoitika pane substrate, zvichikonzera kuwedzera kwe diamond nucleation pane non-diamond substrates. Imwe shanduko ndeyekutsiva filament imwe chete inopisa ne filament dzakasiyana-siyana kuitira kuti pave nekuisa firimu redhaimani rakafanana uye pakupedzisira nzvimbo yakakura yefirimu redhaimani. Dambudziko reHFCVD nderekuti kupiswa kwefilament kunogona kuumba tsvina mufirimu redhaimani.
(2) Microwave Plasma CVD (MWCVD)
Muma1970, masayendisiti akawana kuti huwandu hweatomu hydrogen hwaigona kuwedzerwa vachishandisa DC plasma. Nekuda kweizvozvo, plasma yakava imwe nzira yekukurudzira kuumbwa kwemafirimu edhaimani nekuputsa H2 kuita atomu hydrogen uye kuita kuti mapoka eatomu ane kabhoni ashande. Kuwedzera kuDC plasma, mamwe marudzi maviri eplasma akagamuchirwawo. Microwave plasma CVD ine excitation frequency ye2.45 GHZ, uye RF plasma CVD ine excitation frequency ye13.56 MHz. Microwave plasma dzakasiyana nekuti microwave frequency inokonzera electron vibration. Kana maerekitironi akasangana nemaatomu egasi kana mamorekuru, high dissociation rate inogadzirwa. Microwave plasma inowanzonzi chinhu chine maerekitironi "anopisa", "cold" ions uye neutral particles. Panguva yekuisa thin film, ma microwave anopinda muplasma-enhanced CVD synthesis chamber nepahwindo. Luminescent plasma inowanzova denderedzwa muchimiro, uye saizi yesphere inowedzera nesimba re microwave. Mafirimu matete edhaimani anorimwa pachigadziko chiri mukona yenzvimbo ine chiedza, uye chikamu chacho hachifanirwe kunge chakabatana zvakananga nenzvimbo ine chiedza.
–Chinyorwa ichi chakaburitswa namugadziri wemuchina wevacuum coatingGuangdong Zhenhua
Nguva yekutumira: Chikumi-19-2024