I-Hot filament CVD iyindlela yokuqala nedume kakhulu yokukhulisa idayimane ngengcindezi ephansi. 1982 Matsumoto et al. yashisisa i-refractory metal filament yaba ngaphezu kuka-2000°C, lapho izinga lokushisa igesi i-H2 edlula emculweni ikhiqiza kalula ama-athomu e-hydrogen. Ukukhiqizwa kwe-athomu ye-athomu ngesikhathi se-hydrocarbon pyrolysis kwenyusa izinga lokubekwa kwamafilimu edayimane. Idayimane ifakwa ngokukhetha futhi ukwakheka kwegraphite kuyavinjwa, okuholela emazingeni okubekwa kwefilimu yedayimane ngohlelo lwe-mm/h, okuyizinga eliphezulu kakhulu lokubekwa kwezindlela ezivame ukusetshenziswa embonini. I-HFCVD ingenziwa kusetshenziswa imithombo ye-carbon ehlukahlukene, njenge-methane, i-propane, i-acetylene, namanye ama-hydrocarbon, ngisho nama-hydrocarbon aqukethe umoya-mpilo, njenge-acetone, i-ethanol, ne-methanol. Ukwengezwa kwamaqembu aqukethe umoya-mpilo kunweba izinga lokushisa lokubekwa kwedayimane.
Ngokungeziwe ohlelweni olujwayelekile lwe-HFCVD, kunenani lokuguqulwa kohlelo lwe-HFCVD. Okuvame kakhulu uhlelo oluhlanganisiwe lwe-DC plasma ne-HFCVD. Kulolu hlelo, i-voltage ye-bias ingasetshenziswa ku-substrate kanye ne-filament. Ukuchema okungaguquki okuhle ku-substrate kanye nokuchema okuthile okungekuhle kumcu kubangela ukuthi ama-electron aqhumise i-substrate, okuvumela i-hydrogen engaphezulu ukuthi idle. Umphumela we-desorption ukukhuphuka kwezinga lokubekwa kwefilimu yedayimane (cishe u-10 mm/h), inqubo eyaziwa ngokuthi i-HFCVD esizwa ngama-electron. lapho i-voltage ye-bias iphakeme ngokwanele ukudala ukukhishwa kwe-plasma okuzinzile, ukubola kwe-H2 nama-hydrocarbons kukhula kakhulu, okuholela ekwandeni kwezinga lokukhula. Lapho i-polarity yokuchema ihlehliswa (i-substrate ichemile kabi), ukuqhuma kwe-ion kwenzeka ku-substrate, okuholela ekwandeni kwe-nucleation yedayimane kuma-substrate angewona amadayimane. Okunye ukuguqulwa ukushintshwa kwe-filament eyodwa eshisayo enemicu eminingana ehlukene ukuze kuzuzwe ukufakwa okufanayo futhi ekugcineni kube indawo enkulu yefilimu yedayimane.Ububi be-HFCVD ukuthi ukuhwamuka okushisayo kwe-filament kungenza ukungcola kwifilimu yedayimane.
(2) I-Microwave Plasma CVD (MWCVD)
Ngawo-1970, ososayensi bathola ukuthi ukugcwala kwe-athomu ye-hydrogen kungandiswa kusetshenziswa i-DC plasma. Ngenxa yalokho, i-plasma yaba enye indlela yokukhuthaza ukwakheka kwamafilimu edayimane ngokubola i-H2 ibe yi-athomu ye-hydrogen futhi isebenze amaqembu e-athomu asekelwe kukhabhoni. Ngaphezu kwe-DC plasma, ezinye izinhlobo ezimbili ze-plasma nazo zithole ukunakwa. I-microwave plasma CVD ine-excitation frequency engu-2.45 GHZ, kanti i-RF plasma CVD ine-excitation frequency engu-13.56 MHz. ama-plasma e-microwave ahlukile ngoba imvamisa ye-microwave idonsa ukudlidliza kwama-electron. Lapho ama-electron eshayisana nama-athomu egesi noma ama-molecule, izinga eliphezulu lokuhlukanisa liyakhiqizwa. I-plasma ye-Microwave ivame ukubizwa ngokuthi yindaba ngama-electron "ashisayo", ama-ion "abandayo" kanye nezinhlayiya ezingathathi hlangothi. Ngesikhathi sokufakwa kwefilimu emincane, ama-microwave angena egunjini le-CVD elithuthukisiwe le-plasma ngefasitela. I-plasma ye-luminescent ngokuvamile iyindilinga, futhi ubukhulu bendilinga bayanda ngamandla e-microwave. Amafilimu amancanyana edayimane atshalwa endaweni engaphansi ekhoneni lesifunda esikhanyayo, futhi i-substrate akudingekile ukuthi ixhumane ngqo nesifunda se-luminescent.
-Le ndatshana ikhishwe nguumenzi womshini we-vacuum coatingI-Guangdong Zhenhua
Isikhathi sokuthumela: Jun-19-2024